Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5700601 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai, Akemi Moniwa +1 more | 1997-12-23 |
| 5691115 | Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices | Yoshihiko Okamoto, Akira Imai, Norio Hasegawa, Shinji Okazaki | 1997-11-25 |
| 5621497 | Pattern forming method and projection exposure tool therefor | Shinji Okazaki, Minoru Toriumi | 1997-04-15 |
| 5595857 | Method of forming a pattern and projection exposure apparatus | Hiroshi Fukuda | 1997-01-21 |