Issued Patents 1997
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5700601 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Tsuneo Terasawa, Hiroshi Fukuda, Katsuya Hayano, Akira Imai +1 more | 1997-12-23 |