Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5700601 | Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system | Norio Hasegawa, Tsuneo Terasawa, Hiroshi Fukuda, Akira Imai, Akemi Moniwa +1 more | 1997-12-23 |
| 5656400 | Photomask and pattern forming method employing the same | Norio Hasegawa, Fumio Murai | 1997-08-12 |