Issued Patents 1997
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5674657 | Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers | Shiro Tan, Kenji Honda | 1997-10-07 |
| 5652081 | Positive working photoresist composition | Shiro Tan, Shinji Sakaguchi | 1997-07-29 |
| 5629128 | Positive photoresist composition | Koji Shirakawa, Kenichiro Sato, Kunihiko Kodama, Shinji Sakaguchi | 1997-05-13 |
| 5620828 | Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator | Shiro Tan | 1997-04-15 |
| 5609982 | Positive-working photoresist composition | Kenichiro Sato, Toshiaki Aoai, Shinji Sakaguchi | 1997-03-11 |