Issued Patents 1997
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5700620 | Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound | Toshiaki Aoai, Kenichiro Sato | 1997-12-23 |
| 5683851 | Positive photoresist composition | Shiro Tan | 1997-11-04 |
| 5652081 | Positive working photoresist composition | Shiro Tan, Yasumasa Kawabe | 1997-07-29 |
| 5639587 | Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture | Kenichiro Sato, Koji Shirakawa | 1997-06-17 |
| 5629128 | Positive photoresist composition | Koji Shirakawa, Kenichiro Sato, Kunihiko Kodama, Yasumasa Kawabe | 1997-05-13 |
| 5609982 | Positive-working photoresist composition | Kenichiro Sato, Yasumasa Kawabe, Toshiaki Aoai | 1997-03-11 |
| 5609983 | Positive working photosensitive compositions | Koichi Kawamura, Kenichiro Sato | 1997-03-11 |