TA

Toshiaki Aoai

Fujitsu Limited: 4 patents #59 of 2,531Top 3%
Overall (1997): #5,496 of 185,788Top 3%
4
Patents 1997

Issued Patents 1997

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
5700620 Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound Shinji Sakaguchi, Kenichiro Sato 1997-12-23
5693452 Positive chemically amplified resist composition Toru Fujimori 1997-12-02
5683856 Positive-working photosensitive composition Tsukasa Yamanaka, Kazuya Uenishi 1997-11-04
5609982 Positive-working photoresist composition Kenichiro Sato, Yasumasa Kawabe, Shinji Sakaguchi 1997-03-11