Issued Patents 1997
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5700620 | Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound | Shinji Sakaguchi, Toshiaki Aoai | 1997-12-23 |
| 5667932 | Positive photoresist composition | Kunihiko Kodama, Makoto Momota | 1997-09-16 |
| 5639587 | Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture | Koji Shirakawa, Shinji Sakaguchi | 1997-06-17 |
| 5629128 | Positive photoresist composition | Koji Shirakawa, Kunihiko Kodama, Yasumasa Kawabe, Shinji Sakaguchi | 1997-05-13 |
| 5609982 | Positive-working photoresist composition | Yasumasa Kawabe, Toshiaki Aoai, Shinji Sakaguchi | 1997-03-11 |
| 5609983 | Positive working photosensitive compositions | Koichi Kawamura, Shinji Sakaguchi | 1997-03-11 |