Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5683851 | Positive photoresist composition | Shinji Sakaguchi | 1997-11-04 |
| 5674657 | Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers | Yasumasa Kawabe, Kenji Honda | 1997-10-07 |
| 5652081 | Positive working photoresist composition | Shinji Sakaguchi, Yasumasa Kawabe | 1997-07-29 |
| 5620828 | Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator | Yasumasa Kawabe | 1997-04-15 |