Issued Patents 1994
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5374742 | Positive resist composition | Hirotoshi Nakanishi | 1994-12-20 |
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Naoki Takeyama, Hirotoshi Nakanishi, Ryotaro Hanawa | 1994-11-08 |
| 5336583 | Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone | Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa | 1994-08-09 |
| 5326665 | Positive type resist composition | Haruyoshi Osaki, Hiroshi Moriuma | 1994-07-05 |
| 5290657 | Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound | Hirotoshi Nakanishi | 1994-03-01 |
| 5290656 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto, Fumio Oi +1 more | 1994-03-01 |
| 5288587 | Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound | Haruyoshi Osaki | 1994-02-22 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Doi +1 more | 1994-02-01 |
| 5283155 | Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative | Hirotoshi Nakanishi, Yasunori Doi | 1994-02-01 |
| 5275910 | Positive radiation-sensitive resist composition | Hiroshi Moriuma, Hirotoshi Nakanishi | 1994-01-04 |