Issued Patents 1994
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5374742 | Positive resist composition | Yasunori Uetani | 1994-12-20 |
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Naoki Takeyama, Yasunori Uetani, Ryotaro Hanawa | 1994-11-08 |
| 5290656 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | Yasunori Uetani, Makoto Hanabata, Koji Kuwana, Yukio Hanamoto, Fumio Oi +1 more | 1994-03-01 |
| 5290657 | Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound | Yasunori Uetani | 1994-03-01 |
| 5283155 | Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative | Yasunori Uetani, Yasunori Doi | 1994-02-01 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hiroshi Takagaki, Yasunori Doi, Yasunori Uetani +1 more | 1994-02-01 |
| 5275910 | Positive radiation-sensitive resist composition | Hiroshi Moriuma, Yasunori Uetani | 1994-01-04 |