Issued Patents 1994
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Naoki Takeyama, Yasunori Uetani, Hirotoshi Nakanishi | 1994-11-08 |
| 5354644 | Photoresist compositions comprising styryl compound | Takanori Yamamoto, Shinji Konishi, Akihiro Furuta, Takeshi Hioki, Jun Tomioka | 1994-10-11 |
| 5336583 | Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone | Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki | 1994-08-09 |
| 5283324 | Process for preparing radiation sensitive compound and positive resist composition | Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Hiroshi Takagaki, Yasunori Doi +1 more | 1994-02-01 |