Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12135496 | Reflective mask blank and reflective mask | Yohei IKEBE, Tsutomu Shoki, Hirofumi Kozakai | 2024-11-05 |
| 11880130 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki, Hirofumi Kozakai | 2024-01-23 |
| 11852964 | Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device | Tsutomu Shoki | 2023-12-26 |
| 11480867 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki, Hirofumi Kozakai | 2022-10-25 |
| 11454878 | Substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device | Hirofumi Kozakai | 2022-09-27 |
| 11237472 | Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method | Yohei IKEBE, Junichi Horikawa, Mizuki KATAOKA | 2022-02-01 |
| 11048159 | Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device | Tsutomu Shoki | 2021-06-29 |
| 11003068 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki, Hirofumi Kozakai | 2021-05-11 |
| 10481484 | Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki | 2019-11-19 |
| 9864267 | Reflective mask blank, reflective mask, and method for manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki | 2018-01-09 |
| 9740091 | Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method of manufacturing the same, and method of manufacturing a semiconductor device | Hirofumi Kozakai | 2017-08-22 |
| 9720317 | Substrate with a multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography and method of manufacturing the same, and method of manufacturing a semiconductor device | — | 2017-08-01 |
| 9383637 | Substrate with multilayer reflective film, reflective mask blank for EUV lithography, method of manufacturing reflective mask for EUV lithography and method of manufacturing semiconductor device | Toshihiko Orihara | 2016-07-05 |
| 9183869 | Perpendicular magnetic recording medium and method of manufacturing perpendicular magnetic recording medium | — | 2015-11-10 |
| 9159351 | Perpendicular magnetic recording medium and method of manufacturing the same | Kazuaki Sakamoto, Kong-Kyeom Kim, Masafumi Ishiyama, Teiichiro Umezawa, Kenji Ayama | 2015-10-13 |
| 9142241 | Perpendicular magnetic recording medium and method of manufacturing the same | Tokichiro Sato, Takenori Kajiwara | 2015-09-22 |
| 9064518 | Perpendicular magnetic recording medium | Teiichiro Umezawa | 2015-06-23 |
| 9047903 | Perpendicular magnetic recording medium and process for manufacture thereof | — | 2015-06-02 |
| 8895163 | Perpendicular magnetic recording medium | — | 2014-11-25 |
| 8883249 | Method of producing a perpendicular magnetic recording medium | Toshiaki Tachibana, Keiichi Kajita | 2014-11-11 |
| 8871368 | Perpendicular magnetic recording medium and process for manufacture thereof | Teiichiro Umezawa, Toshiaki Tachibana, Masafumi Ishiyama | 2014-10-28 |
| 8859118 | Perpendicular magnetic recording medium | Toshiaki Tachibana | 2014-10-14 |
| 8623528 | Method of manufacturing perpendicular magnetic recording medium and perpendicular magnetic recording medium | Teiichiro Umezawa, Masafumi Ishiyama, Tokichiro Sato, Kenji Ayama, Junichi Horikawa | 2014-01-07 |
| 8603649 | Perpendicular magnetic recording medium | — | 2013-12-10 |
| 8592061 | Magnetic recording medium with controlled grain diameters | Akira Shimada | 2013-11-26 |