Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12135496 | Reflective mask blank and reflective mask | Yohei IKEBE, Tsutomu Shoki, Takahiro Onoue | 2024-11-05 |
| 11880130 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki, Takahiro Onoue | 2024-01-23 |
| 11650494 | Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method | Masanori Nakagawa | 2023-05-16 |
| 11480867 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki, Takahiro Onoue | 2022-10-25 |
| 11454878 | Substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device | Takahiro Onoue | 2022-09-27 |
| 11256167 | Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method | Masanori Nakagawa | 2022-02-22 |
| 11003068 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Yohei IKEBE, Tsutomu Shoki, Takahiro Onoue | 2021-05-11 |
| 10620527 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method | Kazuhiro Hamamoto, Toshihiko Orihara, Youichi Usui, Tsutomu Shoki, Junichi Horikawa | 2020-04-14 |
| 10429728 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method | Kazuhiro Hamamoto, Toshihiko Orihara, Youichi Usui, Tsutomu Shoki, Junichi Horikawa | 2019-10-01 |
| 10347485 | Reflective mask blank, method for manufacturing same, reflective mask, method for manufacturing same, and method for manufacturing semiconductor device | Tsutomu Shoki, Tatsuo Asakawa | 2019-07-09 |
| 10295900 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method | Toshihiko Orihara, Kazuhiro Hamamoto, Youichi Usui, Tsutomu Shoki, Junichi Horikawa | 2019-05-21 |
| 10001699 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method | Toshihiko Orihara, Kazuhiro Hamamoto, Youichi Usui, Tsutomu Shoki, Junichi Horikawa | 2018-06-19 |
| 9897909 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method | Kazuhiro Hamamoto, Toshihiko Orihara, Youichi Usui, Tsutomu Shoki, Junichi Horikawa | 2018-02-20 |
| 9740091 | Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method of manufacturing the same, and method of manufacturing a semiconductor device | Takahiro Onoue | 2017-08-22 |
| 9507254 | Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor device | Toshihiko Orihara, Kazuhiro Hamamoto, Tsutomu Shoki, Junichi Horikawa | 2016-11-29 |
| 9494851 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method | Toshihiko Orihara, Kazuhiro Hamamoto, Youichi Usui, Tsutomu Shoki, Junichi Horikawa | 2016-11-15 |
| 9348217 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method | Kazuhiro Hamamoto, Toshihiko Orihara, Youichi Usui, Tsutomu Shoki, Junichi Horikawa | 2016-05-24 |