Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6077771 | Method for forming a barrier layer | — | 2000-06-20 |
| 6069037 | Method of manufacturing embedded DRAM | — | 2000-05-30 |
| 6051153 | Etching method | — | 2000-04-18 |
| 6020606 | Structure of a memory cell | — | 2000-02-01 |
| 6010943 | Method of fabricating a cylindrical capacitor | — | 2000-01-04 |
| 6001716 | Fabricating method of a metal gate | — | 1999-12-14 |
| 5994197 | Method for manufacturing dynamic random access memory capable of increasing the storage capacity of the capacitor | — | 1999-11-30 |
| 5989976 | Fabrication method for a field emission display emitter | — | 1999-11-23 |
| 5491365 | Self-aligned ion implanted transition metal contact diffusion barrier apparatus | Maw-Rong Chin, Gary Warren | 1996-02-13 |
| 5479047 | Self-aligned bipolar transistor with very thin dielectric layer interfacing between poly and active area | Maw-Rong Chin | 1995-12-26 |
| 5407841 | CBiCMOS fabrication method using sacrificial gate poly | Maw-Rong Chin, Pen-Chih Chou, Kirk R. Osborne | 1995-04-18 |
| 5389575 | Self-aligned contact diffusion barrier method | Maw-Rong Chin, Gary Warren | 1995-02-14 |
| 5260227 | Method of making a self aligned static induction transistor | Joseph E. Farb, Maw-Rong Chin | 1993-11-09 |
| 5028564 | Edge doping processes for mesa structures in SOS and SOI devices | Chen-Chi P. Chang, Joseph E. Farb | 1991-07-02 |
| 4961822 | Fully recessed interconnection scheme with titanium-tungsten and selective CVD tungsten | Yu C. Chow, Maw-Rong Chin, Charles S. Rhoades | 1990-10-09 |
| 4920403 | Selective tungsten interconnection for yield enhancement | Yu C. Chow, Maw-Rong Chin, Charles S. Rhoades | 1990-04-24 |
| 4847111 | Plasma-nitridated self-aligned tungsten system for VLSI interconnections | Yu C. Chow, Maw-Rong Chin | 1989-07-11 |
| 4767721 | Double layer photoresist process for well self-align and ion implantation masking | William W. Lee | 1988-08-30 |
| 4645562 | Double layer photoresist technique for side-wall profile control in plasma etching processes | Kuang-Yeh Chang, Hsing-Chien Ma | 1987-02-24 |