Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12237398 | Semiconductor device and method for fabricating the same | Chia-Ming Kuo, Po-Jen Chuang, Yu-Ren Wang, Fu-Jung Chuang, Ya-Yin Hsiao +1 more | 2025-02-25 |
| 11063135 | Semiconductor device and method for fabricating the same | Chia-Ming Kuo, Po-Jen Chuang, Yu-Ren Wang, Fu-Jung Chuang, Ya-Yin Hsiao +1 more | 2021-07-13 |
| 9634083 | Semiconductor structure and process thereof | Chien-Liang Lin, Yu-Ren Wang | 2017-04-25 |
| 8921238 | Method for processing high-k dielectric layer | Shao-Wei Wang, Yu-Ren Wang, Chien-Liang Lin, Wen-Yi Teng, Tsuo-Wen Lu +1 more | 2014-12-30 |
| 8895435 | Polysilicon layer and method of forming the same | Chien-Liang Lin, Yun-Ren Wang, Wen-Yi Teng, Chan-Lon Yang | 2014-11-25 |
| 8889523 | Semiconductor process | Te-Lin Sun, Chien-Liang Lin, Yu-Ren Wang | 2014-11-18 |
| 8802579 | Semiconductor structure and fabrication method thereof | Chien-Liang Lin, Shao-Wei Wang, Yu-Ren Wang | 2014-08-12 |
| 8741784 | Process for fabricating semiconductor device and method of fabricating metal oxide semiconductor device | Chien-Liang Lin, Te-Lin Sun, Yu-Ren Wang | 2014-06-03 |
| 8614152 | Gate structure and a method for forming the same | Chien-Liang Lin, Gin-Chen Huang, Yu-Ren Wang | 2013-12-24 |
| 8536038 | Manufacturing method for metal gate using ion implantation | Shao-Wei Wang, Yu-Ren Wang, Chien-Liang Lin, Wen-Yi Teng, Tsuo-Wen Lu +8 more | 2013-09-17 |
| 8501636 | Method for fabricating silicon dioxide layer | Shao-Wei Wang, Yu-Ren Wang, Chien-Liang Lin, Kun-Yuan Lo, Chih-Wei Yang | 2013-08-06 |
| 8426277 | Semiconductor process | Chien-Liang Lin, Shih-Hung Tsai, Chun-Hsien Lin, Te-Lin Sun, Shao-Wei Wang +1 more | 2013-04-23 |
| 8394688 | Process for forming repair layer and MOS transistor having repair layer | Chien-Liang Lin, Yu-Ren Wang | 2013-03-12 |
| 8263501 | Silicon dioxide film fabricating process | Chien-Liang Lin, Yu-Ren Wang | 2012-09-11 |
| 8232605 | Method for gate leakage reduction and Vt shift control and complementary metal-oxide-semiconductor device | Chien-Liang Lin, Yu-Ren Wang, Wu-Chun Kao, Ying-Hsuan Li, Shu-Yen Chan | 2012-07-31 |
| 7811892 | Multi-step annealing process | Yun-Ren Wang, Chien-Hua Lung, Shu-Yen Chan, Kuo-Tai Huang | 2010-10-12 |
| 7709316 | Method of fabricating gate structure | Yun-Ren Wang, Shu-Yen Chan, Kuo-Tai Huang | 2010-05-04 |
| 7601404 | Method for switching decoupled plasma nitridation processes of different doses | Yun-Ren Wang, Shu-Yen Chan, Chen-Kuo Chiang, Chung Y. Chen | 2009-10-13 |
| 7435640 | Method of fabricating gate structure | Yun-Ren Wang, Shu-Yen Chan, Kuo-Tai Huang | 2008-10-14 |
| 7335548 | Method of manufacturing metal-oxide-semiconductor transistor | Yun-Ren Wang, Tony E T Liu | 2008-02-26 |
| 7312139 | Method of fabricating nitrogen-containing gate dielectric layer and semiconductor device | Yu-Ren Wang, Michael Chan | 2007-12-25 |
| 7265065 | Method for fabricating dielectric layer doped with nitrogen | Yun-Ren Wang, Chien-Hua Lung, Kuo-Tai Huang | 2007-09-04 |
| 7214631 | Method of forming gate dielectric layer | Yu-Ren Wang, Liyuan Cheng, Kuo-Tai Huang | 2007-05-08 |
| 7037773 | Method of manufacturing metal-oxide-semiconductor transistor | Yu-Ren Wang, Tony E T Liu | 2006-05-02 |