| 6307174 |
Method for high-density plasma etching |
Chan-Lon Yang, Tong-Yu Chen |
2001-10-23 |
| 6287967 |
Self-aligned silicide process |
Kevin Hsieh, Wen-Yi Hsieh |
2001-09-11 |
| 6281143 |
Method of forming borderless contact |
Hsueh-Hao Shih, Gwo-Shii Yang, Tri-Rung Yew |
2001-08-28 |
| 6254676 |
Method for manufacturing metal oxide semiconductor transistor having raised source/drain |
Gwo-Shii Yang, Chien-Chao Huang, Hsien-Ta Chung, Tri-Rung Yew |
2001-07-03 |
| 6255023 |
Method of manufacturing binary phase shift mask |
Chien-Chao Huang, Juan-Yuan Wu |
2001-07-03 |
| 6249138 |
Method for testing leakage current caused self-aligned silicide |
Gwo-Shii Yang, Hsiao-Ling Lu, Wen-Yi Hsieh |
2001-06-19 |
| 6235606 |
Method of fabricating shallow trench isolation |
Kuo-Tai Huang, Hsiao-Ling Lu, Tri-Rung Yew |
2001-05-22 |
| 6221746 |
Method for forming a poly gate structure |
Tri-Rung Yew |
2001-04-24 |
| 6221712 |
Method for fabricating gate oxide layer |
Kuo-Tai Huang, Tri-Rung Yew |
2001-04-24 |
| 6218084 |
Method for removing photoresist layer |
Chan-Lon Yang, Tong-Yu Chen |
2001-04-17 |
| 6139702 |
Seasoning process for etcher |
Chan-Lon Yang, Tong-Yu Chen |
2000-10-31 |