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Semiconductor device and method of manufacturing the same |
Li-Wei Feng, Shih-Fang Tzou, Chien-Cheng Tsai, Chih-Chi Cheng, Chia-Wei Wu |
2020-12-08 |
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Method for forming semiconductor device having a multi-thickness gate trench dielectric layer |
Tsuo-Wen Lu, Tien-Chen Chan, Shu-Yen Chan |
2020-11-24 |
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Semiconductor device and method of manufacturing the same |
Li-Wei Feng, Shih-Fang Tzou, Chien-Cheng Tsai, Chih-Chi Cheng, Chia-Wei Wu |
2020-05-19 |
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Semiconductor structure with diffusion barrier region and manufacturing method thereof |
Tien-Chen Chan, Shu-Yen Chan |
2020-03-31 |
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Buried word line structure and method of making the same |
Kuan-Chun Lin, Chi-Mao Hsu, Shu-Yen Chan, Shih-Fang Tzou, Tsuo-Wen Lu +4 more |
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Semiconductor device having a multi-thickness gate trench dielectric layer |
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2019-08-06 |
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Method of manufacturing a semiconductor device |
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Buried word line structure and method of making the same |
Kuan-Chun Lin, Chi-Mao Hsu, Shu-Yen Chan, Shih-Fang Tzou, Tsuo-Wen Lu +4 more |
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Yung-Ming Wang, Tien-Chen Chan, Shu-Yen Chan |
2018-08-21 |
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Semiconductor device and fabrication method thereof |
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Lower dose rate ion implantation using a wider ion beam |
Zhimin Wan, Rekha Padmanabhan, Xiao Bai, Gary N. Cai, Ching-I Li +4 more |
2017-08-29 |
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Forming punch-through stopper regions in finFET devices |
Daniel Tang, Zhimin Wan, Ching-I Li |
2016-09-20 |
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Method for ion implantation |
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Semiconductor process |
Chan-Lon Yang, Ching-I Li, I-Ming Lai, Yun-San Huang, Chin-I Liao +1 more |
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