Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11873218 | Sustainable silicates and methods for their extraction | Gerhard Bacher, Holger Henze, Dirk Fliegner, Christoph Manitz, Sebastian Grahl | 2024-01-16 |
| 7329354 | Purification of organic solvent fluids | — | 2008-02-12 |
| 7064070 | Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process | Marc de Leeuwe, Glenn A. Roberson, Jr., Bentley J. Palmer | 2006-06-20 |
| 6871656 | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process | — | 2005-03-29 |
| 6802983 | Preparation of high performance silica slurry using a centrifuge | Glen Jenkins, Michael Jones | 2004-10-12 |
| 6660875 | Ion exchange purification of dielectric condensate precursor fluids and silicate esters such as tetraethylorthosilicate (TEOS) | — | 2003-12-09 |
| 6537916 | Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process | Marc de Leeuwe, Glenn A. Roberson, Jr. | 2003-03-25 |
| 6509141 | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process | — | 2003-01-21 |
| 6500605 | Removal of photoresist and residue from substrate using supercritical carbon dioxide process | Maximilian A. Biberger, Paul Schilling | 2002-12-31 |
| 6322600 | Planarization compositions and methods for removing interlayer dielectric films | Richard J. Brewer, Thomas J. Grebinski, James E. Currie, Michael Jones, Ann Nguyen | 2001-11-27 |
| 6306564 | Removal of resist or residue from semiconductors using supercritical carbon dioxide | — | 2001-10-23 |
| 6277753 | Removal of CMP residue from semiconductors using supercritical carbon dioxide process | Marc de Leeuwe, Glenn A. Roberson, Jr. | 2001-08-21 |
| 5746993 | Process for manufacture of ultra-high purity ammonium hydroxide | — | 1998-05-05 |