PS

Paul Schilling

TL Tokyo Electron Limited: 9 patents #845 of 5,567Top 20%
AL Alliedsignal: 2 patents #730 of 2,631Top 30%
HO Honeywell: 1 patents #7,507 of 14,447Top 55%
Overall (All Time): #425,503 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
7399708 Method of treating a composite spin-on glass/anti-reflective material prior to cleaning 2008-07-15
7270941 Method of passivating of low dielectric materials in wafer processing Dorel I. Toma 2007-09-18
7208411 Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module Maximilian A. Biberger 2007-04-24
7169540 Method of treatment of porous dielectric films to reduce damage during cleaning 2007-01-30
7044662 Developing photoresist with supercritical fluid and developer Chantal Arena-Foster, Allan Awtrey, Nicholas Alan Ryza 2006-05-16
6928746 Drying resist with a solvent bath and supercritical CO2 Chantal Arena-Foster, Allan Awtrey, Nicholas Alan Ryza 2005-08-16
6924086 Developing photoresist with supercritical fluid and developer Chantal Arena-Foster, Allan Awtrey, Nicholas Alan Ryza 2005-08-02
6890853 Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module Maximilian A. Biberger 2005-05-10
6610114 Oxidizing polishing slurries for low dielectric constant materials Dan Towery, Neil H. Hendricks, Tian-An Chen 2003-08-26
6500605 Removal of photoresist and residue from substrate using supercritical carbon dioxide process William H. Mullee, Maximilian A. Biberger 2002-12-31
6270395 Oxidizing polishing slurries for low dielectric constant materials Daniel Towery, Neil H. Hendricks, Tian-An Chen 2001-08-07
6124421 Poly(arylene ether) compositions and methods of manufacture thereof Kreisler Lau, Tian-An Chen, Boris Korolev, Emma Brouk, Heike Thompson 2000-09-26