JR

Jonathan Rullan

TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
IBM: 1 patents #44,794 of 70,183Top 65%
Overall (All Time): #1,208,170 of 4,157,543Top 30%
4
Patents All Time

Issued Patents All Time

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
9524935 Filling cavities in an integrated circuit and resulting devices Sunil Kumar Singh 2016-12-20
7884012 Void-free copper filling of recessed features for semiconductor devices Kenji Suzuki, Tadahiro Ishizaka, Miho Jomen 2011-02-08
7776740 Method for integrating selective low-temperature ruthenium deposition into copper metallization of a semiconductor device Kenji Suzuki, Miho Jomen 2010-08-17
6768111 Method for SEM measurement of topological features Oliver C. Wells, Lynne M. Gignac, Conal E. Murray 2004-07-27