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Contact array optimization for ESD devices |
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Vertical ESD protection device |
Toshiyuki Tani, Hiroshi Yamasaki, Kentaro Takahashi |
2014-03-04 |
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Integrated high voltage capacitor having capacitance uniformity structures and a method of manufacture therefor |
David Leonard Larkin, Makoto Takemura, Ashish V. Gokhale, Dhaval A. Saraiya |
2012-09-25 |
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Integrated high voltage capacitor having capacitance uniformity structures and a method of manufacture therefor |
David Leonard Larkin, Makoto Takemura, Ashish V. Gokhale, Dhaval A. Saraiya |
2012-02-14 |
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Verification method with the implementation of well voltage pseudo diodes |
Wen-Hwa Chu, Shaibal Barua, James Garrett Homack |
2011-02-22 |
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Versatile system for optimizing current gain in bipolar transistor structures |
Joe R. Trogolo, Tathagata Chatterjee, Jeffrey P. Smith |
2009-11-10 |
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Edge recognition based high voltage pseudo layer verification methodology for mix signal design layout |
Haim Horovitz, Robert G. Shaw, Sameer Pendharkar, Wen-Hwa Chu, Paul C. Mannas |
2009-07-14 |
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Integrated high voltage capacitor having capacitance uniformity structures and a method of manufacture therefor |
David Leonard Larkin, Makoto Takemura, Ashish V. Gokhale, Dhaval A. Saraiya |
2008-12-30 |
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Versatile system for optimizing current gain in bipolar transistor structures |
Joe R. Trogolo, Tathagata Chatterlee, Jeff Smith |
2007-06-05 |
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Single poly-emitter PNP using dwell diffusion in a BiCMOS technology |
— |
2007-01-16 |
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2005-10-25 |
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Single poly-emitter PNP using DWELL diffusion in a BiCMOS technology |
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2005-09-27 |
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Transistors formed with grid or island implantation masks to form reduced diffusion-depth regions without additional masks and process steps |
Joe R. Trogolo, Jeff Smith, Sheldon Douglas Haynie |
2005-03-22 |
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Binghua Hu, Chin-Yu Tsai, Jozef Mitros |
2004-10-19 |
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2004-06-08 |
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2004-05-04 |
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Transistors formed with grid or island implantation masks to form reduced diffusion-depth regions without additional masks and process steps |
Jeff Smith, Sheldon Douglas Haynie, Joe R. Trogolo |
2004-04-06 |