Issued Patents All Time
Showing 101–104 of 104 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5773364 | Method for using ammonium salt slurries for chemical mechanical polishing (CMP) | Melissa Freeman | 1998-06-30 |
| 5710069 | Measuring slurry particle size during substrate polishing | James Mullins | 1998-01-20 |
| 5614444 | Method of using additives with silica-based slurries to enhance selectivity in metal CMP | Rahul Jairath, Matt Stell, Sing-Mo Tzeng | 1997-03-25 |
| 5478435 | Point of use slurry dispensing system | James J. Murphy, Lucia C. Markert, Rahul Jairath | 1995-12-26 |