DD

David DeKraker

TF Tel Fsi: 11 patents #1 of 33Top 4%
FI Fsi International: 3 patents #16 of 131Top 15%
📍 Burnsville, MN: #49 of 632 inventorsTop 8%
🗺 Minnesota: #5,333 of 52,454 inventorsTop 15%
Overall (All Time): #348,501 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
9887107 Methodologies for rinsing tool surfaces in tools used to process microelectronic workpieces Mark A. Stiyer 2018-02-06
9831107 Processing system and method for providing a heated etching solution Kevin L. Siefering, William P. Inhofer 2017-11-28
9666456 Method and apparatus for treating a workpiece with arrays of nozzles Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2017-05-30
9412628 Acid treatment strategies useful to fabricate microelectronic devices and precursors thereof 2016-08-09
9412639 Method of using separate wafer contacts during wafer processing Kevin L. Siefering 2016-08-09
9263303 Methodologies for rinsing tool surfaces in tools used to process microelectronic workpieces Mark A. Stiyer 2016-02-16
8978675 Method and apparatus for treating a workpiece with arrays of nozzles Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2015-03-17
8967167 Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2015-03-03
8920577 Process for treatment of substrates with water vapor or steam Jeffery W. Butterbaugh, Richard E. Williamson 2014-12-30
8668778 Method of removing liquid from a barrier structure Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2014-03-11
8387635 Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2013-03-05
8142571 Process for treatment of semiconductor wafer using water vapor containing environment Kurt K. Christenson 2012-03-27
7913706 Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses Jimmy D. Collins, Tracy A. Gast, Alan D. Rose, Richard E. Williamson 2011-03-29
7819984 Process for treatment of substrates with water vapor or steam Jeffery W. Butterbaugh, Richard E. Williamson 2010-10-26