Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10588212 | Plasma initiation in an inductive RF coupling mode | — | 2020-03-10 |
| 9386677 | Plasma concentration apparatus and method | — | 2016-07-05 |
| 8852522 | Plasma de-activation apparatus and method | — | 2014-10-07 |
| 8841574 | Plasma extension and concentration apparatus and method | — | 2014-09-23 |
| 7871830 | End point detection method for plasma etching of semiconductor wafers with low exposed area | Sumer Johal, Barton Lane, Sylvia Spruytte, Herve C. Kieffel | 2011-01-18 |
| 7015415 | Higher power density downstream plasma | — | 2006-03-21 |
| 6263831 | Downstream plasma using oxygen gas mixtures | — | 2001-07-24 |
| 6112696 | Downstream plasma using oxygen gas mixture | — | 2000-09-05 |
| 4579618 | Plasma reactor apparatus | Salvatore A. Celestino, Stephen E. Hilliker, Gary Powell | 1986-04-01 |
| 4464223 | Plasma reactor apparatus and method | — | 1984-08-07 |
| 4357195 | Apparatus for controlling a plasma reaction | — | 1982-11-02 |
| 4264393 | Reactor apparatus for plasma etching or deposition | Paul C. Lindsey, Jr. | 1981-04-28 |
| 4263088 | Method for process control of a plasma reaction | — | 1981-04-21 |
| 4209357 | Plasma reactor apparatus | Josef T. Hoog | 1980-06-24 |