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Plasma initiation in an inductive RF coupling mode |
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2020-03-10 |
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Plasma concentration apparatus and method |
— |
2016-07-05 |
| 8852522 |
Plasma de-activation apparatus and method |
— |
2014-10-07 |
| 8841574 |
Plasma extension and concentration apparatus and method |
— |
2014-09-23 |
| 7871830 |
End point detection method for plasma etching of semiconductor wafers with low exposed area |
Sumer Johal, Barton Lane, Sylvia Spruytte, Herve C. Kieffel |
2011-01-18 |
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Higher power density downstream plasma |
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2006-03-21 |
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Downstream plasma using oxygen gas mixtures |
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2001-07-24 |
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Downstream plasma using oxygen gas mixture |
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2000-09-05 |
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Plasma reactor apparatus |
Salvatore A. Celestino, Stephen E. Hilliker, Gary Powell |
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Plasma reactor apparatus and method |
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1984-08-07 |
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Apparatus for controlling a plasma reaction |
— |
1982-11-02 |
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Reactor apparatus for plasma etching or deposition |
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1981-04-28 |
| 4263088 |
Method for process control of a plasma reaction |
— |
1981-04-21 |
| 4209357 |
Plasma reactor apparatus |
Josef T. Hoog |
1980-06-24 |