Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10340382 | Embedded source or drain region of transistor with downward tapered region under facet region | Che-Cheng Chang, Tung-Wen Cheng, Zhe Zhang | 2019-07-02 |
| 10312352 | Gate structure of field effect transistor with footing | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin | 2019-06-04 |
| 10304178 | Method and system for diagnosing a semiconductor wafer | Peng Chen, Shiang-Bau Wang, Wen-Hao Cheng, Wei-Chung Hu, Yi-An Huang +1 more | 2019-05-28 |
| 10177238 | High-K film apparatus and method | Che-Cheng Chang, Yi-Ren Chen, Chang-Yin Chen, Yi-Jen Chen, Ming Zhu +1 more | 2019-01-08 |
| 10164109 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Tung-Wen Cheng, Che-Cheng Chang | 2018-12-25 |
| 10164107 | Embedded source or drain region of transistor with laterally extended portion | Che-Cheng Chang, Chang-Yin Chen | 2018-12-25 |
| 10164108 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Tung-Wen Cheng, Chang-Yin Chen, Che-Cheng Chang | 2018-12-25 |
| 10128355 | Method for forming fin field effect transistor (FINFET) device | Che-Cheng Chang | 2018-11-13 |
| 10050128 | Gate structure of field effect transistor with footing | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin | 2018-08-14 |
| 10043887 | Methods for forming a semiconductor device with a gate stack having angled sidewalls | Che-Cheng Chang, Yi-Jen Chen, Chang-Yin Chen | 2018-08-07 |
| 9991285 | Mechanisms for forming FinFET device | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin | 2018-06-05 |
| 9870955 | Formation method of semiconductor device structure | Che-Cheng Chang, Yi-Jen Chen | 2018-01-16 |
| 9853154 | Embedded source or drain region of transistor with downward tapered region under facet region | Che-Cheng Chang, Tung-Wen Cheng, Zhe Zhang | 2017-12-26 |
| 9773696 | Semiconductor structure and manufacturing method thereof | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin | 2017-09-26 |
| 9735256 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Che-Cheng Chang, Chih-Han Lin, Jr-Jung Lin, Shih-Hao Chen, Mu-Tsang Lin | 2017-08-15 |
| 9660052 | Strained source and drain (SSD) structure and method for forming the same | Che-Cheng Chang, Tung-Wen Cheng, Yi-Jen Chen | 2017-05-23 |
| 9653605 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Tung-Wen Cheng, Chang-Yin Chen, Che-Cheng Chang | 2017-05-16 |
| 9627375 | Indented gate end of non-planar transistor | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin, Yi-Jen Chen | 2017-04-18 |
| 9620621 | Gate structure of field effect transistor with footing | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin | 2017-04-11 |
| 9608113 | Semiconductor device structure | Che-Cheng Chang, Yi-Jen Chen | 2017-03-28 |
| 9553171 | Fin field effect transistor (FinFET) device and method for forming the same | Che-Cheng Chang | 2017-01-24 |
| 9520474 | Methods of forming a semiconductor device with a gate stack having tapered sidewalls | Che-Cheng Chang, Chang-Yin Chen, Yi-Jen Chen | 2016-12-13 |
| 9456536 | Method for pins detection and insertion of electronic component | Kuo-Feng Hung, Yen-Chia Peng | 2016-09-27 |
| 9401415 | Fin field effect transistor (FinFET) device and method for forming the same | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin | 2016-07-26 |
| 9385214 | Method of forming a selectively adjustable gate structure | Che-Cheng Chang, Young Liao, Yi-Jen Chen | 2016-07-05 |