Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12433006 | Semiconductor device with conductive liners over silicide structures and method of making the semiconductor device | Kuan-Kan Hu, Shuen-Shin Liang, Chia-Hung Chu, Po-Chin Chang, Hsu-Kai Chang +8 more | 2025-09-30 |
| 12327788 | Gate to source drain interconnects | Shuen-Shin Liang, Chia-Hung Chu, Po-Chin Chang, Tzu-Pei Chen, Ken-Yu Chang +6 more | 2025-06-10 |
| 12328890 | Contact with a silicide region | Yu-Wen Cheng, Cheng-Tung Lin, Chih-Wei Chang, Hong-Mao Lee, Ming-Hsing Tsai +6 more | 2025-06-10 |
| 12300900 | Ammonium fluoride pre-clean protection | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Hung-Hsu Chen, Chih-Wei Chang +1 more | 2025-05-13 |
| 12300496 | Deposition window enlargement | Meng-Han Chou, Kuan-Yu Yeh, Hung-Hsu Chen, Su-Hao Liu, Liang-Yin Chen +2 more | 2025-05-13 |
| 12300542 | Semiconductor device pre-cleaning | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Hung-Hsu Chen, Chih-Wei Chang +1 more | 2025-05-13 |
| 12272621 | Buried conductive structure in semiconductor substrate | Kan-Ju Lin, Lin-Yu Huang, Min-Hsuan Lu, Hong-Mao Lee, Harry CHIEN | 2025-04-08 |
| 12218012 | Method of manufacturing semiconductor devices with multiple silicide regions | Yan-Ming Tsai, Hung-Hsu Chen, Chih-Wei Chang, Sheng-Hsuan Lin | 2025-02-04 |
| 12166078 | Contact structure for semiconductor device and method | Yan-Ming Tsai, Chih-Wei Chang, Ming-Hsing Tsai, Sheng-Hsuan Lin, Hung-Hsu Chen | 2024-12-10 |
| 12087642 | Selective dual silicide formation | Yan-Ming Tsai, Yi-Ning Tai, Raghunath PUTIKAM, Hung-Yi Huang, Hung-Hsu Chen +1 more | 2024-09-10 |
| 12046510 | Conductive feature formation and structure | Chih-Wei Chang, Hong-Mao Lee, Chun-Hsien Huang, Yu-Ming Huang, Yan-Ming Tsai +4 more | 2024-07-23 |
| 12009200 | Treatment for adhesion improvement | Ching-Yi Chen, Hung-Hsu Chen, Chih-Wei Chang | 2024-06-11 |
| 11915976 | Semiconductor device pre-cleaning | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Hung-Hsu Chen, Chih-Wei Chang +1 more | 2024-02-27 |
| 11901229 | Barrier-free approach for forming contact plugs | Ching-Yi Chen, Sheng-Hsuan Lin, Hung-Hsu Chen, Chih-Wei Chang | 2024-02-13 |
| 11810826 | Semiconductor devices with stacked silicide regions | Yan-Ming Tsai, Hung-Hsu Chen, Chih-Wei Chang, Sheng-Hsuan Lin | 2023-11-07 |
| 11742210 | Deposition window enlargement | Meng-Han Chou, Kuan-Yu Yeh, Hung-Hsu Chen, Su-Hao Liu, Liang-Yin Chen +2 more | 2023-08-29 |
| 11676868 | Selective dual silicide formation | Yan-Ming Tsai, Yi-Ning Tai, Raghunath PUTIKAM, Hung-Yi Huang, Hung-Hsu Chen +1 more | 2023-06-13 |
| 11594410 | Treatment for adhesion improvement | Ching-Yi Chen, Hung-Hsu Chen, Chih-Wei Chang | 2023-02-28 |
| 11411094 | Contact with a silicide region | Yu-Wen Cheng, Cheng-Tung Lin, Chih-Wei Chang, Hong-Mao Lee, Ming-Hsing Tsai +6 more | 2022-08-09 |
| 11373905 | Semiconductor device pre-cleaning | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Hung-Hsu Chen, Chih-Wei Chang +1 more | 2022-06-28 |
| 11348839 | Method of manufacturing semiconductor devices with multiple silicide regions | Yan-Ming Tsai, Hung-Hsu Chen, Chih-Wei Chang, Sheng-Hsuan Lin | 2022-05-31 |
| 11342225 | Barrier-free approach for forming contact plugs | Ching-Yi Chen, Sheng-Hsuan Lin, Hung-Hsu Chen, Chih-Wei Chang | 2022-05-24 |
| 11335774 | Contact structure for semiconductor device and method | Yan-Ming Tsai, Chih-Wei Chang, Ming-Hsing Tsai, Sheng-Hsuan Lin, Hung-Hsu Chen | 2022-05-17 |
| 11232947 | Ammonium fluoride pre-clean protection | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Hung-Hsu Chen, Chih-Wei Chang +1 more | 2022-01-25 |
| 11195791 | Method for forming semiconductor contact structure | Yu-Wen Cheng, Yu-Hsiang Liao, Sheng-Hsuan Lin, Hong-Mao Lee, Chun-I Tsai +4 more | 2021-12-07 |