Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12419077 | Method for forming dual silicide in manufacturing process of semiconductor structure | Ying-Chi SU, Li-Wei Chu, Chih-Wei Chang, Ming-Hsing Tsai | 2025-09-16 |
| 12328890 | Contact with a silicide region | Yu-Wen Cheng, Cheng-Tung Lin, Chih-Wei Chang, Hong-Mao Lee, Ming-Hsing Tsai +6 more | 2025-06-10 |
| 12300900 | Ammonium fluoride pre-clean protection | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Wei-Yip Loh, Chih-Wei Chang +1 more | 2025-05-13 |
| 12300496 | Deposition window enlargement | Meng-Han Chou, Kuan-Yu Yeh, Wei-Yip Loh, Su-Hao Liu, Liang-Yin Chen +2 more | 2025-05-13 |
| 12300542 | Semiconductor device pre-cleaning | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Wei-Yip Loh, Chih-Wei Chang +1 more | 2025-05-13 |
| 12218012 | Method of manufacturing semiconductor devices with multiple silicide regions | Wei-Yip Loh, Yan-Ming Tsai, Chih-Wei Chang, Sheng-Hsuan Lin | 2025-02-04 |
| 12166078 | Contact structure for semiconductor device and method | Yan-Ming Tsai, Chih-Wei Chang, Ming-Hsing Tsai, Sheng-Hsuan Lin, Wei-Yip Loh | 2024-12-10 |
| 12087642 | Selective dual silicide formation | Wei-Yip Loh, Yan-Ming Tsai, Yi-Ning Tai, Raghunath PUTIKAM, Hung-Yi Huang +1 more | 2024-09-10 |
| 12046510 | Conductive feature formation and structure | Wei-Yip Loh, Chih-Wei Chang, Hong-Mao Lee, Chun-Hsien Huang, Yu-Ming Huang +4 more | 2024-07-23 |
| 12009200 | Treatment for adhesion improvement | Ching-Yi Chen, Wei-Yip Loh, Chih-Wei Chang | 2024-06-11 |
| 11915976 | Semiconductor device pre-cleaning | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Wei-Yip Loh, Chih-Wei Chang +1 more | 2024-02-27 |
| 11901229 | Barrier-free approach for forming contact plugs | Ching-Yi Chen, Sheng-Hsuan Lin, Wei-Yip Loh, Chih-Wei Chang | 2024-02-13 |
| 11810826 | Semiconductor devices with stacked silicide regions | Wei-Yip Loh, Yan-Ming Tsai, Chih-Wei Chang, Sheng-Hsuan Lin | 2023-11-07 |
| 11742210 | Deposition window enlargement | Meng-Han Chou, Kuan-Yu Yeh, Wei-Yip Loh, Su-Hao Liu, Liang-Yin Chen +2 more | 2023-08-29 |
| 11676868 | Selective dual silicide formation | Wei-Yip Loh, Yan-Ming Tsai, Yi-Ning Tai, Raghunath PUTIKAM, Hung-Yi Huang +1 more | 2023-06-13 |
| 11594410 | Treatment for adhesion improvement | Ching-Yi Chen, Wei-Yip Loh, Chih-Wei Chang | 2023-02-28 |
| 11411094 | Contact with a silicide region | Yu-Wen Cheng, Cheng-Tung Lin, Chih-Wei Chang, Hong-Mao Lee, Ming-Hsing Tsai +6 more | 2022-08-09 |
| 11373905 | Semiconductor device pre-cleaning | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Wei-Yip Loh, Chih-Wei Chang +1 more | 2022-06-28 |
| 11348839 | Method of manufacturing semiconductor devices with multiple silicide regions | Wei-Yip Loh, Yan-Ming Tsai, Chih-Wei Chang, Sheng-Hsuan Lin | 2022-05-31 |
| 11342225 | Barrier-free approach for forming contact plugs | Ching-Yi Chen, Sheng-Hsuan Lin, Wei-Yip Loh, Chih-Wei Chang | 2022-05-24 |
| 11335774 | Contact structure for semiconductor device and method | Yan-Ming Tsai, Chih-Wei Chang, Ming-Hsing Tsai, Sheng-Hsuan Lin, Wei-Yip Loh | 2022-05-17 |
| 11232947 | Ammonium fluoride pre-clean protection | Li-Wei Chu, Ying-Chi SU, Yu-Kai Chen, Wei-Yip Loh, Chih-Wei Chang +1 more | 2022-01-25 |
| 11177172 | Semiconductor structure | Yan-Ming Tsai, Wei-Yip Loh, Yu-Ming Huang, Chih-Wei Chang | 2021-11-16 |
| 11031286 | Conductive feature formation and structure | Wei-Yip Loh, Chih-Wei Chang, Hong-Mao Lee, Chun-Hsien Huang, Yu-Ming Huang +4 more | 2021-06-08 |
| 10840184 | Formation of copper layer structure with self anneal strain improvement | Jun-Nan Nian, Shiu-Ko JangJian, Chi-Cheng Hung, Yu-Sheng Wang | 2020-11-17 |