Issued Patents All Time
Showing 151–175 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879126 | Semiconductor device and method | Zheng-Yang Pan, Cheng-Han Lee, Shih-Chieh Chang | 2020-12-29 |
| 10879124 | Method to form a fully strained channel region | Chun-Chieh Wang, Huai-Tei Yang, Zheng-Yang Pan, Shih-Chieh Chang, Cheng-Han Lee | 2020-12-29 |
| 10879396 | Semiconductor device with source/drain structures | Zheng-Yang Pan, Chun-Chieh Wang, Cheng-Han Lee, Shih-Chieh Chang | 2020-12-29 |
| 10879240 | Fin field effect transistor (FinFET) device structure | Chun-Chieh Wang, Zheng-Yang Pan, Shih-Chieh Chang, Yi-Min Huang, Tsung-Lin Lee | 2020-12-29 |
| 10867799 | FinFET device and methods of forming same | Chun-Chieh Wang, Zheng-Yang Pan, Shih-Chieh Chang, Cheng-Han Lee, Huai-Tei Yang | 2020-12-15 |
| 10868183 | FinFET device and methods of forming the same | Shih-Chieh Chang, Cheng-Han Lee | 2020-12-15 |
| 10840358 | Method for manufacturing semiconductor structure with source/drain structure having modified shape | Shih-Chieh Chang, Cheng-Han Lee, Huai-Tei Yang | 2020-11-17 |
| 10749010 | Method for manufacturing finFET structure with doped region | Chun Hsiung Tsai, Cheng-Yi Peng, Shih-Chieh Chang, Kuo-Feng Yu | 2020-08-18 |
| 10734524 | Semiconductor device with multi-layered source/drain regions having different dopant concentrations and manufacturing method thereof | Chih-Yu Ma, Zheng-Yang Pan, Shih-Chieh Chang, Cheng-Han Lee | 2020-08-04 |
| 10720530 | Semiconductor device and methods of forming same | Chih-Yu Ma, Yi-Min Huang, Shih-Chieh Chang | 2020-07-21 |
| 10686074 | Fin field effect transistor (FinFET) device structure with doped region in source/drain structure and method for forming the same | Chun Hsiung Tsai, Cheng-Yi Peng, Yu-Ming Lin, Kuo-Feng Yu, Ziwei Fang | 2020-06-16 |
| 10680106 | Method of forming source/drain epitaxial stacks | Huai-Tei Yang, Shih-Chieh Chang, Cheng-Han Lee | 2020-06-09 |
| 10672886 | Structure and method for high-k metal gate | Cheng-Han Lee, Zheng-Yang Pan, Shih-Chieh Chang, Chun-Chieh Wang | 2020-06-02 |
| 10651287 | Method for forming source/drain contacts | Chun Hsiung Tsai, Shih-Chieh Chang, Kuo-Feng Yu, Cheng-Yi Peng | 2020-05-12 |
| 10636909 | Formation method of semiconductor device with source/drain structures | Zheng-Yang Pan, Chun-Chieh Wang, Cheng-Han Lee, Shih-Chieh Chang | 2020-04-28 |
| 10629496 | Methods for forming transistor gates with hafnium oxide layers and lanthanum oxide layers | Zheng-Yang Pan, Chun-Chieh Wang, Shih-Chieh Chang | 2020-04-21 |
| 10535736 | Fully strained channel | Huai-Tei Yang, Zheng-Yang Pan, Shih-Chieh Chang, Chun-Chieh Wang, Cheng-Han Lee | 2020-01-14 |
| 10522358 | FinFET device and methods of forming same | Chun-Chieh Wang, Zheng-Yang Pan, Shih-Chieh Chang, Cheng-Han Lee, Huai-Tei Yang | 2019-12-31 |
| 10510871 | Semiconductor device and method | Shih-Chieh Chang | 2019-12-17 |
| 10510889 | P-type strained channel in a fin field effect transistor (FinFET) device | Huai-Tei Yang, Shih-Chieh Chang, Shu Kuan, Cheng-Han Lee | 2019-12-17 |
| 10468500 | FinFET fabrication methods | Chun Hsiung Tsai, Cheng-Yi Peng, Yin-Pin Wang, Kuo-Feng Yu, Da-Wen Lin +1 more | 2019-11-05 |
| 10396156 | Method for FinFET LDD doping | Chun Hsiung Tsai, Ya-Yun Cheng, Cheng-Yi Peng, Wei-Yang Lee, Kuo-Feng Yu +2 more | 2019-08-27 |
| 10361279 | Method for manufacturing FinFET structure with doped region | Chun Hsiung Tsai, Cheng-Yi Peng, Shih-Chieh Chang, Kuo-Feng Yu | 2019-07-23 |
| 10347764 | Semiconductor device with multi-layered source/drain regions having different dopant concentrations and manufacturing method thereof | Chih-Yu Ma, Zheng-Yang Pan, Shih-Chieh Chang, Cheng-Han Lee | 2019-07-09 |
| 10269646 | Semiconductor device and method | Zheng-Yang Pan, Cheng-Han Lee, Shih-Chieh Chang | 2019-04-23 |