Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7125802 | CMP process leaving no residual oxide layer or slurry particles | Ying-Lang Wang, Shih-Chi Lin, Yi-Lung Cheng, Chi-Wen Liu, Wen-Kung Cheng +1 more | 2006-10-24 |
| 6903019 | CMP process leaving no residual oxide layer or slurry particles | Ying-Lang Wang, Shih-Chi Lin, Yi-Lung Cheng, Chi-Wen Liu, Wen-Kung Cheng +1 more | 2005-06-07 |
| 6660638 | CMP process leaving no residual oxide layer or slurry particles | Ying-Lang Wang, Shih-Chi Lin, Yi-Lung Cheng, Chi-Wen Liu, Wen-Kung Cheng +1 more | 2003-12-09 |