Issued Patents All Time
Showing 26–35 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8631360 | Methodology of optical proximity correction optimization | Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Feng-Ju Chang, Cheng Kun Tsai +2 more | 2014-01-14 |
| 8627241 | Pattern correction with location effect | Ming-Hui Chih, Cheng Kun Tsai, Wen-Chun Huang, Ru-Gun Liu | 2014-01-07 |
| 8609308 | Smart subfield method for E-beam lithography | Pei-Shiang Chen, Jeng-Horng Chen, Cheng-Hung Chen, Shih-Chi Wang, Nian-Fuh Cheng +1 more | 2013-12-17 |
| 8601407 | Geometric pattern data quality verification for maskless lithography | Pei-Shiang Chen, Tzu-Chin Lin, Cheng-Hung Chen, Shih-Chi Wang, Nian-Fuh Cheng +3 more | 2013-12-03 |
| 8507159 | Electron beam data storage system and method for high volume manufacturing | Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Jeng-Horng Chen, Wen-Chun Huang +1 more | 2013-08-13 |
| 8473877 | Striping methodology for maskless lithography | Tzu-Chin Lin, Nian-Fuh Cheng, Jeng-Horng Chen, Wen-Chun Huang, Ru-Gun Liu | 2013-06-25 |
| 8468473 | Method for high volume e-beam lithography | Tzu-Chin Lin, Chia-Chi Lin, Nian-Fuh Cheng, Jeng-Horng Chen, Wen-Chun Huang +1 more | 2013-06-18 |
| 8464186 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Jeng-Horng Chen, Shy-Jay Lin, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2013-06-11 |
| 7387855 | Anti-ESD photomask blank | Eric T. Chiang, Min-Chih Hsieh, Ming-Tao Ho | 2008-06-17 |
| 7348106 | Method for repairing a phase shift mask | Ming-Chih Hsieh, Han-Lin Wu | 2008-03-25 |