Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12249520 | Wet etch apparatus | Hong Lu | 2025-03-11 |
| 12142664 | Reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrode | Shih Wei Bih, Xuan-You Yan, Yen-Yu Chen, Chun-Chih Lin | 2024-11-12 |
| 11626315 | Semiconductor structure and planarization method thereof | Chun-Jung Huang, Hsu-Shui Liu, Yu-Yao Huang, Hsiao-Wei Chen, Yung-Lin Hsu +1 more | 2023-04-11 |
| 11367591 | Composite plasma modulator for plasma chamber | — | 2022-06-21 |
| 11222788 | Methods of enhancing surface topography on a substrate for inspection | Jun Liu, Chun-Chih Lin | 2022-01-11 |
| 11107707 | Wet etch apparatus and method of using the same | Hong Lu | 2021-08-31 |
| 11011426 | Semiconductor device and manufacturing method thereof | — | 2021-05-18 |
| 10879052 | Plasma processing apparatus and manufacturing method using the same | — | 2020-12-29 |
| 10872760 | Cluster tool and manufacuturing method of semiconductor structure using the same | — | 2020-12-22 |
| 10872788 | Wet etch apparatus and method for using the same | Hong Lu | 2020-12-22 |
| 10784114 | Methods of enhancing surface topography on a substrate for inspection | Jun Liu, Chun-Chih Lin | 2020-09-22 |
| 10504737 | Methods of enhancing surface topography on a substrate for inspection | Jun Liu, Chun-Chih Lin | 2019-12-10 |
| 10446662 | Reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrode | Shih Wei Bih, Xuan-You Yan, Yen-Yu Chen, Chun-Chih Lin | 2019-10-15 |
| 10026638 | Plasma distribution control | — | 2018-07-17 |
| 9412606 | Target dimension uniformity for semiconductor wafers | Chih-Yu Lin, Cherng-Chang Tsuei | 2016-08-09 |
| 9362185 | Uniformity in wafer patterning using feedback control | Chung-Hsi Wu, Chih-Yu Lin, Cherng-Chang Tsuei | 2016-06-07 |
| 9324578 | Hard mask reshaping | Chih-Yu Lin, Cherng-Chang Tsuei | 2016-04-26 |
| 9087793 | Method for etching target layer of semiconductor device in etching apparatus | Wei-Tai Lin, Wen-Sheng Wang, Chih-Yu Lin, Cherng-Chang Tsuei, Chen-Hsiang Lu | 2015-07-21 |
| 9064741 | Uniformity in wafer patterning using feedback control | Chung-Hsi Wu, Chih-Yu Lin, Cherng-Chang Tsuei | 2015-06-23 |