Issued Patents All Time
Showing 1–25 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12396235 | Semiconductor device and method for forming the same | Mahaveer Sathaiya Dhanyakumar, Cheng-Ting Chung, Chien-Hong Chen, Jin Cai | 2025-08-19 |
| 12396240 | Source/drain silicide for multigate device performance and method of fabricating thereof | Chih-Ching Wang, Chung-I Yang, Jon-Hsu Ho, Wen-Hsing Hsieh, Zhiqiang Wu | 2025-08-19 |
| 12382691 | Effective work function tuning via silicide induced interface dipole modulation for metal gates | Yen-Tien Tung, Szu-Wei Huang, Zhi-Ren Xiao, Yin-Chuan Chuang, Yung-Chien Huang +3 more | 2025-08-05 |
| 12376309 | Ferroelectric memory device and method of forming the same | Peng-Chun Liou, Zhiqiang Wu, Ya-Yun Cheng | 2025-07-29 |
| 12349418 | Semiconductor device and manufacturing method thereof | Wei Ju Lee, Chun-Fu Cheng, Zhiqiang Wu | 2025-07-01 |
| 12349380 | Gate all around transistor device and fabrication methods thereof | Chih-Ching Wang, Chia-Ying Su, Wen-Hsing Hsieh, Kuan-Lun Cheng, Zhiqiang Wu | 2025-07-01 |
| 12317526 | Multi-gate devices and fabricating the same with etch rate modulation | Chih-Ching Wang, Chung-I Yang, Jon-Hsu Ho, Wen-Hsing Hsieh, Kuan-Lun Cheng +1 more | 2025-05-27 |
| 12310029 | Semiconductor memory device and manufacturing method thereof | Yu-Chien Chiu, Meng-Han Lin, Chun-Fu Cheng, Han-Jong Chia, Zhiqiang Wu | 2025-05-20 |
| 12300749 | Source/drain features with improved strain properties | Chih-Ching Wang, Wen-Yuan Chen, Wen-Hsing Hsieh, Kuan-Lun Cheng, Zhiqiang Wu | 2025-05-13 |
| 12237414 | Source/drain features with improved strain properties | Chih-Ching Wang, Wen-Yuan Chen, Wen-Hsing Hsieh, Kuan-Lun Cheng, Zhiqiang Wu | 2025-02-25 |
| 12218214 | Source/drain silicide for multigate device performance and method of fabricating thereof | Chih-Ching Wang, Chung-I Yang, Jon-Hsu Ho, Wen-Hsing Hsieh, Zhiqiang Wu | 2025-02-04 |
| 12199170 | Method of manufacturing a multi-gate device having a semiconductor seed layer embedded in an isolation layer | Wei Ju Lee, Chun-Fu Cheng, Zhiqiang Wu | 2025-01-14 |
| 12190931 | Semiconductor memory devices and methods of manufacturing thereof | Peng-Chun Liou, Zhiqiang Wu, Yi-Ching Liu, Yih Wang | 2025-01-07 |
| 12174545 | System and method for performing extreme ultraviolet photolithography processes | Tai-Yu Chen, Sagar Deepak Khivsara, Kuo-An Liu, Chieh Hsieh, Shang-Chieh Chien +5 more | 2024-12-24 |
| 12131496 | Method and system for object identification | TUNG-CHUN HSIEH, SUNG-CHUAN LEE, Chien-Ming Ko, TZE-CHIN LO, Chih-Wei Li +1 more | 2024-10-29 |
| 12125848 | Semiconductor device structure incorporating air gap | Chih-Ching Wang, Chun Chung Su, Jon-Hsu Ho, Kuan-Lun Cheng, Wen-Hsing Hsieh +2 more | 2024-10-22 |
| 12040222 | Air-replaced spacer for self-aligned contact scheme | Meng-Yu Lin, Chun-Fu Cheng, Zhiqiang Wu | 2024-07-16 |
| 12034044 | Semiconductor devices and methods of fabrication thereof | Shin-Jiun Kuang, Meng-Yu Lin, Chun-Fu Cheng | 2024-07-09 |
| 12029042 | 3D memory device with modulated doped channel | Peng-Chun Liou, Zhiqiang Wu, Yi-Ching Liu, Chia-En Huang | 2024-07-02 |
| 12009408 | Multi-gate devices having a semiconductor layer between an inner spacer and an epitaxial feature | Wei Ju Lee, Chun-Fu Cheng, Zhiqiang Wu | 2024-06-11 |
| 11990522 | Effective work function tuning via silicide induced interface dipole modulation for metal gates | Yen-Tien Tung, Szu-Wei Huang, Zhi-Ren Xiao, Yin-Chuan Chuang, Yung-Chien Huang +3 more | 2024-05-21 |
| 11951638 | Computer device and method for determining standard depth value of marker | TUNG-CHUN HSIEH, Chih-Wei Li, Chia-Yi Lin | 2024-04-09 |
| 11949001 | Multi-gate devices and fabricating the same with etch rate modulation | Chih-Ching Wang, Chung-I Yang, Jon-Hsu Ho, Wen-Hsing Hsieh, Kuan-Lun Cheng +1 more | 2024-04-02 |
| 11929409 | Semiconductor device with improved source and drain contact area and methods of fabrication thereof | Wei Ju Lee, Chun-Fu Cheng, Zhiqiang Wu | 2024-03-12 |
| 11908919 | Multi-gate devices with multi-layer inner spacers and fabrication methods thereof | Chih-Ching Wang, Jon-Hsu Ho, Wen-Hsing Hsieh, Kuan-Lun Cheng, Zhiqiang Wu | 2024-02-20 |