Issued Patents All Time
Showing 1–25 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12356656 | FinFET structures and methods of forming the same | Yu-Sheng Wang, Chi-Cheng Hung, Chia-Ching Lee, Chung-Chiang Wu | 2025-07-08 |
| 12283595 | Integration of multiple transistors having fin and mesa structures | Sung-Hsin Yang, Ru-Shang Hsiao, Chen-Bin Lin, Wen-Hsin Chan | 2025-04-22 |
| 12170280 | Method of manufacturing gate structure and method of manufacturing fin-field effect transistor | Ji-Cheng Chen, Kuan-Ting Liu, Shih-Hang Chiu | 2024-12-17 |
| 12142531 | Pre-deposition treatment for FET technology and devices formed thereby | Cheng-Yen Tsai, Chung-Chiang Wu, Tai-Wei Hwang, Hung-Chin Chung, Wei-Chin Lee +3 more | 2024-11-12 |
| 12142530 | Semiconductor device and method of manufacture | Chung-Chiang Wu, Hung-Chin Chung, Hsien-Ming Lee, Chien-Hao Chen | 2024-11-12 |
| 12113120 | Gate electrode having a work-function layer including materials with different average grain sizes | Ru-Shang Hsiao, Pin Chia Su, Ying Hsin Lu, Ling-Sung Wang | 2024-10-08 |
| 12033893 | Contact plug with impurity variation | Chung-Chiang Wu, Hsueh Wen Tsau, Chia-Ching Lee, Cheng-Lung Hung | 2024-07-09 |
| 12021147 | FinFET structures and methods of forming the same | Yu-Sheng Wang, Chi-Cheng Hung, Chia-Ching Lee, Chung-Chiang Wu | 2024-06-25 |
| 12021130 | Circuit structure with gate configuration | Ru-Shang Hsiao, Ying Hsin Lu, Pin Chia Su, Ling-Sung Wang | 2024-06-25 |
| 11961891 | Structure for metal gate electrode and method of fabrication | Ru-Shang Hsiao, Pohan Kung, Ying Hsin Lu, I-Shan Huang | 2024-04-16 |
| 11949000 | Metal gate structures and methods of fabricating the same in field-effect transistors | Ru-Shang Hsiao, Pin Chia Su, Ying Hsin Lu, I-Shan Huang | 2024-04-02 |
| 11935957 | Geometry for threshold voltage tuning on semiconductor device | Chung-Chiang Wu, Wei-Chin Lee, Shih-Hang Chiu, Chia-Ching Lee, Hsueh Wen Tsau +3 more | 2024-03-19 |
| 11855083 | Gate structure, fin field-effect transistor, and method of manufacturing fin-field effect transistor | Ji-Cheng Chen, Kuan-Ting Liu, Shih-Hang Chiu | 2023-12-26 |
| 11855098 | Semiconductor devices having dipole-inducing elements | Cheng-Yen Tsai, Ming-Chi Huang, Zoe Chen, Wei-Chin Lee, Cheng-Lung Hung +2 more | 2023-12-26 |
| 11769694 | Contact plug with impurity variation | Chung-Chiang Wu, Hsueh Wen Tsau, Chia-Ching Lee, Cheng-Lung Hung | 2023-09-26 |
| 11742395 | Selective etching to increase threshold voltage spread | Hsin-Yi Lee, Ya-Huei Li, Da-Yuan Lee | 2023-08-29 |
| 11728341 | Semiconductor device and method | Chung-Chiang Wu, Shih-Hang Chiu, Chih-Chang Hung, I-Wei Yang, Shu-Yuan Ku +2 more | 2023-08-15 |
| 11699621 | Method for patterning a lanthanum containing layer | Kun-Yu Lee, Huicheng Chang, Che-Hao Chang, Weng Chang, Xiong-Fei Yu | 2023-07-11 |
| 11616132 | Semiconductor device and methods of manufacture | Yu-Sheng Wang, Chi-Cheng Hung, Chia-Ching Lee | 2023-03-28 |
| 11588038 | Circuit structure with gate configuration | Ru-Shang Hsiao, Ying Hsin Lu, Pin Chia Su, Ling-Sung Wang | 2023-02-21 |
| 11563120 | FinFET structures and methods of forming the same | Yu-Sheng Wang, Chi-Cheng Hung, Chia-Ching Lee, Chung-Chiang Wu | 2023-01-24 |
| 11502080 | Semiconductor device and method | Cheng-Yen Tsai, Ming-Chi Huang, Zoe Chen, Wei-Chin Lee, Cheng-Lung Hung +2 more | 2022-11-15 |
| 11502185 | Methods of manufacturing a gate electrode having metal layers with different average grain sizes | Ru-Shang Hsiao, Pin Chia Su, Ying Hsin Lu, Ling-Sung Wang | 2022-11-15 |
| 11476351 | Metal gate structures and methods of fabricating the same in field-effect transistors | Ru-Shang Hsiao, Pin Chia Su, Ying Hsin Lu, I-Shan Huang | 2022-10-18 |
| 11404312 | Contact plug with impurity variation | Chung-Chiang Wu, Hsueh Wen Tsau, Chia-Ching Lee, Cheng-Lung Hung | 2022-08-02 |