CT

Chih-Yuan Ting

TSMC: 81 patents #362 of 12,232Top 3%
Overall (All Time): #22,035 of 4,157,543Top 1%
81
Patents All Time

Issued Patents All Time

Showing 51–75 of 81 patents

Patent #TitleCo-InventorsDate
9892960 Interconnect structure and method of forming the same Jeng-Shiou Chen, Jyu-Horng Shieh, Minghsing Tsai 2018-02-13
9818643 Semiconductor interconnect structure and manufacturing method thereof 2017-11-14
9666534 Semiconductor interconnect structure and manufacturing method thereof 2017-05-30
9640435 Patterning approach for improved via landing profile Chung-Wen Wu 2017-05-02
9627250 Method and apparatus for back end of line semiconductor device processing Chung-Wen Wu, Jyu-Horng Shieh 2017-04-18
9601344 Method of forming pattern for semiconductor device Chia-Ying Lee, Jyu-Horng Shieh, Ming-Hsing Tsai, Syun-Ming Jang 2017-03-21
9601348 Interconnect structure and method of forming same Ming-Hui Chu, Jyu-Horng Shieh 2017-03-21
9583384 Via corner engineering in trench-first dual damascene process 2017-02-28
9570341 Semiconductor device having air gap structures and method of fabricating thereof Jyu-Horng Shieh 2017-02-14
9564355 Interconnect structure for semiconductor devices 2017-02-07
9524902 Method of forming integrated circuit with conductive line having line-ends Pei-Wen Huang, Jyu-Horng Shieh 2016-12-20
9502287 Method of preventing pattern collapse Chung-Wen Wu, Jeng-Shiou Chen, Jang-Shiang Tsai, Jyu-Horng Shieh 2016-11-22
9496224 Semiconductor device having air gap structures and method of fabricating thereof Jyu-Horng Shieh 2016-11-15
9472448 Contact plug without seam hole and methods of forming the same Jyu-Horng Shieh 2016-10-18
9437541 Patterning approach to reduce via to via minimum spacing Chung-Wen Wu 2016-09-06
9412650 Interconnect structure and method of forming the same Jeng-Shiou Chen 2016-08-09
9406589 Via corner engineering in trench-first dual damascene process 2016-08-02
9401329 Interconnect structure and method of forming the same Jeng-Shiou Chen, Jyu-Horng Shieh, Minghsing Tsai 2016-07-26
9397047 Interconnect structure and method of forming the same Jeng-Shiou Chen, Jyu-Horng Shieh, Ming-Hsing Tsai 2016-07-19
9312222 Patterning approach for improved via landing profile Chung-Wen Wu 2016-04-12
9287212 Semiconductor device interconnection structure having dielectric-filled notches Chung-Wen Wu 2016-03-15
9257298 Systems and methods for in situ maintenance of a thin hardmask during an etch process Chung-Wen Wu 2016-02-09
9153479 Method of preventing a pattern collapse Chung-Wen Wu, Jeng-Shiou Chen, Jang-Shiang Tsai, Jyu-Horng Shieh 2015-10-06
9142450 Interconnect structure and method of forming the same Jeng-Shiou Chen, Jyu-Horng Shieh, Minghsing Tsai 2015-09-22
9076729 Method of forming interconnection structure having notches for semiconductor device Chung-Wen Wu 2015-07-07