Issued Patents All Time
Showing 51–57 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6737362 | Method for manufacturing a thin gate dielectric layer for integrated circuit fabrication | Chia-Lin Chen, Chun-Lin Wu, Tze-Liang Lee, Shih-Chang Chen | 2004-05-18 |
| 6727134 | Method of forming a nitride gate dielectric layer for advanced CMOS devices | Tze-Liang Lee, Shih-Chang Chen | 2004-04-27 |
| 6706581 | Dual gate dielectric scheme: SiON for high performance devices and high k for low power devices | Tou-Hung Hou, Ming-Fang Wang, Chih-Wei Yang, Liang-Gi Yao, Shih-Chang Chen | 2004-03-16 |
| 6642117 | Method for forming composite dielectric layer | Tze-Liang Lee, Shih-Chang Chen | 2003-11-04 |
| 6602799 | Method of forming a uniform ultra-thin gate oxide layer | Wen-Shan Chang, Michael Chang, Shih-Chang Chen | 2003-08-05 |
| 6495432 | Method of improving a dual gate CMOS transistor to resist the boron-penetrating effect | Horng-Chih Lin, Chun-Yen Chang, Tiao-Yuan Huang | 2002-12-17 |
| 6432786 | Method of forming a gate oxide layer with an improved ability to resist the process damage | Horng-Chih Lin, Chun-Yen Chang, Tiao-Yuan Huang | 2002-08-13 |