CT

Cheng-Yuan Tsai

TSMC: 220 patents #63 of 12,232Top 1%
UM United Microelectronics: 25 patents #203 of 4,560Top 5%
DN Delta Networks: 1 patents #10 of 25Top 40%
EA Elfa International Ab: 1 patents #11 of 16Top 70%
📍 Cukeng, TW: #1 of 12 inventorsTop 9%
Overall (All Time): #1,995 of 4,157,543Top 1%
249
Patents All Time

Issued Patents All Time

Showing 226–249 of 249 patents

Patent #TitleCo-InventorsDate
6764965 Method for improving the coating capability of low-k dielectric layer Tsung-Tang Hsieh, Chih-An Huang 2004-07-20
6677231 Method for increasing adhesion ability of dielectric material in semiconductor Chin-Hsiang Lin, Ming-Sheng Yang 2004-01-13
6670715 Bilayer silicon carbide based barrier Neng-Hui Yang, Hsin-Chang Wu 2003-12-30
6653204 Method of forming a shallow trench isolation structure Hsin-Chang Wu, Neng-Hui Yang, Wen-Hsun Lin 2003-11-25
6599826 Method for fabricating a low dielectric constant material layer Tsung-Tang Hsieh 2003-07-29
6554002 Method for removing etching residues Chih-Ning Wu, Chan-Lon Yang 2003-04-29
6521545 Method of a surface treatment on a fluorinated silicate glass film Neng-Hui Yang, Chinh-Fu Lin, Yi-Fang Cheng 2003-02-18
6521300 Method of a surface treatment in improving adhesion of an organic polymeric low-k dielectric layer Tsung-Tang Hsieh, Hsin-Chang Wu, Chih-An Huang 2003-02-18
6486079 Method for stabilizing low dielectric constant materials Yung-Tsung Wei, Teng-Chun Tsai, Ming-Sheng Yang 2002-11-26
6429115 Method of manufacturing multilevel interconnects including performing a surface treatment to form a hydrophilic surface layer Chin-Hsiang Lin, Ming-Sheng Yang 2002-08-06
6410106 Method of forming an intermetal dielectric layer Chih-Chien Liu, Ming-Sheng Yang 2002-06-25
6410446 Method for gap filling Chih-Chien Liu, Ming-Sheng Yang 2002-06-25
6383913 Method for improving surface wettability of low k material Ming-Sheng Yang 2002-05-07
6376394 Method of forming inter-metal dielectric layer Chih-Chien Liu, Ming-Sheng Yang 2002-04-23
6365228 Process for spin-on coating with an organic material having a low dielectric constant Ming-Sheng Yang, Chin-Hsiang Lin 2002-04-02
6323123 Low-K dual damascene integration process Chih-Chien Liu, Anseime Chen, Ming-Sheng Yang 2001-11-27
6319814 Method of fabricating dual damascene Chih-Chien Liu, Juan-Yuan Wu 2001-11-20
6261977 Method for preventing an electrostatic chuck from being corroded during a cleaning process Chih-Chien Liu, Juan-Yuan Wu 2001-07-17
6218284 Method for forming an inter-metal dielectric layer Chih-Chien Liu, Wen-Yi Hsieh, Water Lur 2001-04-17
6200653 Method of forming an intermetal dielectric layer Chih-Chien Liu, Ming-Sheng Yang 2001-03-13
6197681 Forming copper interconnects in dielectric materials with low constant dielectrics Chih-Chien Liu, Ming-Sheng Yang 2001-03-06
6174793 Method for enhancing adhesion between copper and silicon nitride Chih-Chien Liu, Juan-Yuan Wu 2001-01-16
6146974 Method of fabricating shallow trench isolation (STI) Chih-Chien Liu, Gwo-Shii Yang, Juan-Yuan Wu 2000-11-14
6001746 Method of forming an undoped silicate glass layer on a semiconductor wafer Chih-Chien Liu, Wen-Yi Hsieh, Water Lur 1999-12-14