Issued Patents All Time
Showing 151–175 of 392 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10686077 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Tung-Wen Cheng, Chang-Yin Chen, Yung-Jung Chang | 2020-06-16 |
| 10686060 | Structure and formation method of semiconductor device structure | Jui-Ping Chuang, Chen-Hsiang Lu, Wei-Ting Chen, Yu-Cheng Liu | 2020-06-16 |
| 10686059 | Structure of semiconductor device structure having fins | Jui-Ping Chuang, Chen-Hsiang Lu, Yu-Cheng Liu, Wei-Ting Chen | 2020-06-16 |
| 10679989 | Enlarging spacer thickness by forming a dielectric layer over a recessed interlayer dielectric | Chih-Han Lin, Horng-Huei Tseng | 2020-06-09 |
| 10672908 | Fin field effect transistor | Chih-Han Lin, Horng-Huei Tseng | 2020-06-02 |
| 10672796 | Mechanisms for forming FINFET device | Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin, Yung-Jung Chang | 2020-06-02 |
| 10665700 | Semiconductor device and method | Bo-Feng Young, Po-Chi Wu | 2020-05-26 |
| 10643947 | Semiconductor structure and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2020-05-05 |
| 10636787 | Semiconductor structure and manufacturing method thereof | Po-Chi Wu, Chih-Han Lin, Horng-Huei Tseng | 2020-04-28 |
| 10629491 | Semiconductor manufacturing method | Chih-Han Lin, Wei-Ting Chen | 2020-04-21 |
| 10622353 | Semiconductor device | Chih-Han Lin, Horng-Huei Tseng | 2020-04-14 |
| 10553706 | Method for manufacturing semiconductor fin structure with extending gate structure | Chih-Han Lin | 2020-02-04 |
| 10546956 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Tung-Wen Cheng, Yung-Jung Chang | 2020-01-28 |
| 10546754 | Semiconductor structure and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2020-01-28 |
| 10541298 | Etching process control in forming MIM capacitor | Hung-Hao Chen, Wen-Tung Chen, Yu-Cheng Liu, Horng-Huei Tseng | 2020-01-21 |
| 10541204 | Interconnection structure and method of forming the same | Chih-Han Lin | 2020-01-21 |
| 10535758 | Gate structure of field effect transistor with footing | Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin, Yung-Jung Chang | 2020-01-14 |
| 10535727 | Etching process control in forming MIM capacitor | Hung-Hao Chen, Wen-Tung Chen, Yu-Cheng Liu, Horng-Huei Tseng | 2020-01-14 |
| 10535603 | Method of forming interconnection structure | Chih-Han Lin | 2020-01-14 |
| 10535558 | Method of forming trenches | Chih-Han Lin | 2020-01-14 |
| 10535566 | Semiconductor device and method of manufacture | Hung-Hao Chen, Horng-Huei Tseng, Wen-Tung Chen, Yu-Cheng Liu | 2020-01-14 |
| 10529822 | Gate structure having designed profile | Kai-Li Cheng | 2020-01-07 |
| 10522635 | Semiconductor device and method | Chih-Han Lin, Horng-Huei Tseng | 2019-12-31 |
| 10522414 | Method and structure for FinFET isolation | Chih-Han Lin, Jr-Jung Lin | 2019-12-31 |
| 10522536 | Structure and formation method of semiconductor device with gate stacks | Chih-Han Lin, Horng-Huei Tseng | 2019-12-31 |