Issued Patents All Time
Showing 26–50 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11916105 | Semiconductor device with corner isolation protection and methods of forming the same | Bwo-Ning Chen, Xusheng Wu, Pin-Ju Liang, Shih-Hao Lin | 2024-02-27 |
| 11854906 | Gate structures for semiconductor devices | Chun-Fai Cheng, Kuan-Chung Chen | 2023-12-26 |
| 11855155 | Semiconductor device having contact feature and method of fabricating the same | Xusheng Wu, Ying-Keung Leung, Huiling Shang, Youbo Lin | 2023-12-26 |
| 11837631 | Source/drain spacer with air gap in semiconductor devices and methods of fabricating the same | Ko-Cheng Liu, Ming-Lung Cheng | 2023-12-05 |
| 11837662 | Devices with strained isolation features | Xusheng Wu, Huiling Shang | 2023-12-05 |
| 11769819 | Semiconductor device structure with metal gate stack | Xusheng Wu, Huiling Shang | 2023-09-26 |
| 11756835 | Semiconductor device with air gaps between metal gates and method of forming the same | Wei-Lun Min, Xusheng Wu | 2023-09-12 |
| 11742386 | Doping for semiconductor device with conductive feature | Su-Hao Liu, Huicheng Chang, Chia-Cheng Chen, Liang-Yin Chen, Kuo-Ju Chen +4 more | 2023-08-29 |
| 11728405 | Stress-inducing silicon liner in semiconductor devices | Bwo-Ning Chen, Xusheng Wu, Shih-Hao Lin | 2023-08-15 |
| 11715803 | Method of forming transistors of different configurations | Wei-Lun Min | 2023-08-01 |
| 11688647 | Semiconductor device and method for manufacturing the same | Bwo-Ning Chen, Xu-Sheng Wu | 2023-06-27 |
| 11688768 | Integrated circuit structure with source/drain spacers | Ko-Cheng Liu, Ming-Lung Cheng | 2023-06-27 |
| 11600695 | Dielectric fins with air gap and backside self-aligned contact | Ko-Cheng Liu, Ming-Shuan Li, Ming-Lung Cheng | 2023-03-07 |
| 11594680 | Method of forming a FinFET device | Bwo-Ning Chen, Kei-Wei Chen | 2023-02-28 |
| 11527444 | Air spacer formation for semiconductor devices | Wei-Lun Min | 2022-12-13 |
| 11450741 | Doping for semiconductor device with conductive feature | Su-Hao Liu, Huicheng Chang, Chia-Cheng Chen, Liang-Yin Chen, Kuo-Ju Chen +4 more | 2022-09-20 |
| 11444179 | Isolation structures in multi-gate semiconductor devices and methods of fabricating the same | Xusheng Wu, Huiling Shang | 2022-09-13 |
| 11430890 | Integrated circuits with channel-strain liner | Xusheng Wu, Huiling Shang | 2022-08-30 |
| 11387146 | Semiconductor device with air gaps between metal gates and method of forming the same | Wei-Lun Min, Xusheng Wu | 2022-07-12 |
| 11362217 | Method of forming transistors of different configurations | Wei-Lun Min | 2022-06-14 |
| 11355615 | FinFET having fluorine-doped gate sidewall spacers | Wei-Lun Min, Xu-Sheng Wu | 2022-06-07 |
| 11302784 | Semiconductor device having contact feature and method of fabricating the same | Xusheng Wu, Ying-Keung Leung, Huiling Shang, Youbo Lin | 2022-04-12 |
| 11277360 | Generic disambiguation | Jing Chen, Ye-Kui Wang, Jiang Chen | 2022-03-15 |
| 11145650 | Gate cut dielectric feature and method of forming the same | Xusheng Wu, Huiling Shang | 2021-10-12 |
| 11139432 | Methods of forming a FinFET device | Bwo-Ning Chen, Kei-Wei Chen | 2021-10-05 |