Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12363935 | Methods for forming multi-gate transistors | Chang-Miao Liu | 2025-07-15 |
| 12356703 | Air spacer formation for semiconductor devices | Chang-Miao Liu | 2025-07-08 |
| 12313929 | Display panel and display apparatus | Shiming SHANG, Xiaoqing Peng, Hailin Xue, Weida Qin, Yanyun Li +2 more | 2025-05-27 |
| 12230720 | Semiconductor structure with recessed top semiconductor layer in substrate and method of fabricating the same | Ko-Cheng Liu, Chang-Miao Liu | 2025-02-18 |
| 12100625 | Semiconductor device with air gaps between metal gates and method of forming the same | Xusheng Wu, Chang-Miao Liu | 2024-09-24 |
| 12062707 | Method of manufacturing a field effect transistor by tilted implantation of dopants into inner sidewalls of gate spacers | Chang-Miao Liu, Xu-Sheng Wu | 2024-08-13 |
| 11973128 | Methods for forming multi-gate transistors | Chang-Miao Liu | 2024-04-30 |
| 11756835 | Semiconductor device with air gaps between metal gates and method of forming the same | Xusheng Wu, Chang-Miao Liu | 2023-09-12 |
| 11715803 | Method of forming transistors of different configurations | Chang-Miao Liu | 2023-08-01 |
| 11527444 | Air spacer formation for semiconductor devices | Chang-Miao Liu | 2022-12-13 |
| 11387146 | Semiconductor device with air gaps between metal gates and method of forming the same | Xusheng Wu, Chang-Miao Liu | 2022-07-12 |
| 11362217 | Method of forming transistors of different configurations | Chang-Miao Liu | 2022-06-14 |
| 11355615 | FinFET having fluorine-doped gate sidewall spacers | Chang-Miao Liu, Xu-Sheng Wu | 2022-06-07 |
| 10870541 | Logistics trolley and production line using the same | Fan Peng, Haibin Liu, Fangqing Li, Yong Sun, Baoyong Nie +1 more | 2020-12-22 |
| 10233031 | Display panel turnover device and method for using the same | Xikui HAO, Zhiyu Qian, Yong Sun, Fangqing Li, Anlong Xu | 2019-03-19 |