Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7911022 | Isolation structure in field device | You-Kuo Wu, Shun-Liang Hsu | 2011-03-22 |
| 7247909 | Method for forming an integrated circuit with high voltage and low voltage devices | Fu-Hsin Chen, Wen Huang, Kuo-Ting Lee, You-Kuo Wu | 2007-07-24 |
| 6534356 | Method of reducing dark current for an image sensor device via use of a polysilicon pad | Hua Yang, Wei-Kun Yeh, Chi-Hsiang Lee | 2003-03-18 |
| 6514785 | CMOS image sensor n-type pin-diode structure | Chi-Hsiang Lee, Wei-Kun Yeh, Hua Yang | 2003-02-04 |
| 6350127 | Method of manufacturing for CMOS image sensor | Chi-Hsiang Lee, Wei-Kun Yeh | 2002-02-26 |
| 6306678 | Process for fabricating a high quality CMOS image sensor | Chi-Hsiang Lee, Wei-Kun Yeh, Hua Yang | 2001-10-23 |
| 6159660 | Opposite focus control to avoid keyholes inside a passivation layer | Hsin Chen, Pei-Hung Chen | 2000-12-12 |
| 5915178 | Method for improving the endurance of split gate flash EEPROM devices via the addition of a shallow source side implanted region | Long-Shang Juang, Chi-Shiang Lee, Jyh-Feng Lin | 1999-06-22 |
| 5811343 | Oxidation method for removing fluorine gas inside polysilicon during semiconductor manufacturing to prevent delamination of subsequent layer induced by fluorine outgassing dielectric | Yeh-Jye Wann, Shaun Yu, Pei-Hung Chen | 1998-09-22 |
| 5753548 | Method for preventing fluorine outgassing-induced interlevel dielectric delamination on P-channel FETS | Shau-Tsung Yu, Yeh-Jye Wann, Pei-Hung Chen | 1998-05-19 |
| 5707896 | Method for preventing delamination of interlevel dielectric layer over FET P.sup.+ doped polysilicon gate electrodes on semiconductor integrated circuits | Shau-Tsung Yu, Yeh-Jye Wann, Pei-Hung Chen | 1998-01-13 |
| 5700739 | Method of multi-step reactive ion etch for patterning adjoining semiconductor metallization layers | Wei-Kun Yeh | 1997-12-23 |
| 5652172 | Method for controlling the etch profile of an aperture formed through a multi-layer insulator layer | Peng Yung-Sung, Shau-Tsung Yu, Min-Yi Lin | 1997-07-29 |
| 5449639 | Disposable metal anti-reflection coating process used together with metal dry/wet etch | John Wei, Kuo-Chin Hsu | 1995-09-12 |