YU

Yuji Ueda

SC Sumitomo Chemical: 16 patents #231 of 4,033Top 6%
NI Ngk Insulators: 7 patents #448 of 2,083Top 25%
PA Panasonic: 5 patents #5,165 of 21,108Top 25%
DA Daihen: 3 patents #87 of 305Top 30%
TI Toray Industries: 2 patents #1,308 of 3,690Top 40%
Canon: 2 patents #12,681 of 19,416Top 70%
Ricoh Company: 1 patents #6,936 of 9,818Top 75%
SS Shiga University Of Medical Science: 1 patents #13 of 44Top 30%
HB Hgst Netherlands, B.V.: 1 patents #510 of 972Top 55%
KS Kobe Steel: 1 patents #937 of 1,773Top 55%
TO Toshiba: 1 patents #1,121 of 2,688Top 45%
TC Toyo Seikan Co.: 1 patents #498 of 888Top 60%
YJ Yahoo Japan: 1 patents #90 of 217Top 45%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
Overall (All Time): #69,900 of 4,157,543Top 2%
43
Patents All Time

Issued Patents All Time

Showing 26–43 of 43 patents

Patent #TitleCo-InventorsDate
6156476 Positive photoresist composition Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto, Yuko Nakano 2000-12-05
6101068 MR composite-type thin-film magnetic head having an upper pole with a high saturation magnetic flux density and an intermediate pole with a high resistivity Shigekazu Ohtomo, Shuji Sudo, Kuniaki Yoshimura, Hideji Takahashi 2000-08-08
5846688 Photoresist composition Nobuhito Fukui, Naoki Takeyama, Takehiro Kusumoto, Yuko Yako, Shigeki Yamamoto 1998-12-08
5800966 Positive photoresist composition Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto 1998-09-01
5585218 Photoresist composition containing alkyletherified polyvinylphenol Yuko Nakano, Naoki Takeyama, Takehiro Kusumoto, Hiromi Oka 1996-12-17
5420331 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto 1995-05-30
5397679 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto 1995-03-14
5395727 Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol Yasunori Uetani, Haruyoshi Osaki, Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto 1995-03-07
5304456 Negative photoresist composition Hiromi Ueki, Naoki Takeyama, Takehiro Kusumoto 1994-04-19
5235068 Process for producing acylaromatic compounds Masayoshi Minai, Michitada Kondo, Seiichi Kai, Takayuki Higashii 1993-08-10
4957867 Production of cyclopentenones by enzyme resolution Masayoshi Minai, Takayuki Higashii, Michitada; Kondo, Seiichi Kai 1990-09-18
4812585 Process for producing 2-aceylfuran derivatives Michitada Kondo, Masayoshi Minai, Seiichi Kai, Takayuki Higashii 1989-03-14
4714782 Process for preparing optically active 4-hydroxy-2-cyclopentenones Masayoshi Minai 1987-12-22
4683323 Method for inversion of optically active 4-hydroxy-2-cyclopentenones Masayoshi Minai 1987-07-28
4596943 Shadow mask for a color picture tube Eiichi Akiyoshi 1986-06-24
4352941 Process for purification of phenylhydrazine Shinichi Hasegawa, Hiroshige Tomita 1982-10-05
4336109 Method for the recovery of acetone Hirokazu Hosaka, Kenji Tanimoto, Kunihiko Tanaka, Toshiharu Morita, Katsuyuki Shiota +1 more 1982-06-22
4308110 Process for separation and purification of dihydric phenols Hirokazu Hosaka, Kunihiko Tanaka, Toshiharu Morita, Katsuyuki Shiota 1981-12-29