CS

Charles R. Szmanda

SL Shipley Company, L.L.C.: 23 patents #11 of 401Top 3%
RM Rohm And Haas Electronic Materials: 9 patents #62 of 562Top 15%
University of California: 2 patents #4,561 of 18,278Top 25%
AT AT&T: 1 patents #10,626 of 18,772Top 60%
Rohm And Haas: 1 patents #1,282 of 2,359Top 55%
📍 Bethlehem, PA: #26 of 1,038 inventorsTop 3%
🗺 Pennsylvania: #1,316 of 74,527 inventorsTop 2%
Overall (All Time): #94,669 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 26–36 of 36 patents

Patent #TitleCo-InventorsDate
6110641 Radiation sensitive composition containing novel dye Peter Trefonas, III, Gerald C. Vizvary 2000-08-29
6077643 Polymers and photoresist compositions Uday Kumar, Roger F. Sinta, Leonard Edward Bogan, Jr. 2000-06-20
6057083 Polymers and photoresist compositions Gary N. Taylor 2000-05-02
5876899 Photoresist compositions Gary N. Taylor, Robert L. Brainard, Manuel DoCanto 1999-03-02
5866299 Negative photoresist composition Peter Trefonas, III 1999-02-02
5674662 Process for removing metal ions from organic photoresist solutions Richard J. Carey 1997-10-07
5571657 Modified cation exhange process Richard J. Carey 1996-11-05
5472616 Modified anion exchange process Richard J. Carey 1995-12-05
5443736 Purification process Richard J. Carey 1995-08-22
5178986 Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol Anthony Zampini, David C. Madoux, Peter Trefonas, III 1993-01-12
4462860 End point detection 1984-07-31