TY

Takanori Yamamoto

SC Shinko Electric Industries Co.: 13 patents #67 of 723Top 10%
KT Kabushiki Kaisha Toshiba: 3 patents #8,011 of 21,451Top 40%
PA Panasonic: 2 patents #9,678 of 21,108Top 50%
MM Mitsubishi Motors: 2 patents #508 of 1,823Top 30%
RE Renesas Electronics: 2 patents #1,855 of 4,529Top 45%
SI Sanyo Chemical Industries: 2 patents #123 of 607Top 25%
SC Sumitomo Osaka Cement Co.: 2 patents #133 of 327Top 45%
SC Sumitomo Chemical: 2 patents #1,792 of 4,033Top 45%
ME Mitsubishi Jidosha Engineering: 2 patents #32 of 277Top 15%
TO Toyota: 1 patents #15,335 of 26,838Top 60%
NE Nec: 1 patents #7,889 of 14,502Top 55%
TL Teijin Limited: 1 patents #850 of 1,631Top 55%
Honda Motor Co.: 1 patents #12,035 of 21,052Top 60%
Overall (All Time): #100,512 of 4,157,543Top 3%
34
Patents All Time

Issued Patents All Time

Showing 26–34 of 34 patents

Patent #TitleCo-InventorsDate
8076678 Package for photoelectric wiring and lead frame 2011-12-13
7865052 Optical waveguide having an optical transmission direction changing part Hideki Yonekura, Kazunao Yamamoto, Kenji Yanagisawa 2011-01-04
7796851 Manufacturing method of optical waveguide, optical waveguide and optical reception/transmission apparatus Hideki Yonekura, Kazunao Yamamoto, Kenji Yanagisawa 2010-09-14
7734124 Optical waveguide and method of manufacturing the same, and method of manufacturing optical/electrical hybrid substrate Hideki Yonekura, Kazunao Yamamoto, Kenji Yanagisawa 2010-06-08
7596289 Optical/electrical hybrid substrate Kenji Yanagisawa 2009-09-29
6676911 Exhaust gas treating agent, process for producing the same, and method of treating exhaust gas Hiroaki Suzuki, Kensuke Kanai, Shingo Jami, Kouiti Yukutake, Shigehiro Kobayashi 2004-01-13
6419741 Cement clinker and cement containing the same Tatsuo Ikabata, Seiichi Nagaoka, Tatsushi Akiyama, Ayaji Yasumoto 2002-07-16
5354644 Photoresist compositions comprising styryl compound Shinji Konishi, Ryotaro Hanawa, Akihiro Furuta, Takeshi Hioki, Jun Tomioka 1994-10-11
5218136 Styryl compounds, process for preparing the same and photoresist compositions comprising the same Shinji Konishi, Ryotaro Hanawa, Akirhiro Furuta, Takeshi Hioki, Jun Tomioka 1993-06-08