Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7722738 | Semiconductor device manufacturing unit and semiconductor device manufacturing method | Katsushi Kishimoto, Yusuke Fukuoka, Yasushi Fujioka, Hiroyuki Fukuda | 2010-05-25 |
| 7565880 | Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same | Akira Shimizu, Yuhsuke Fukuoka, Yasushi Fujioka, Katsushi Kishimoto | 2009-07-28 |
| 7195673 | Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same | Akira Shimizu, Yuhsuke Fukuoka, Yasushi Fujioka, Katsushi Kishimoto | 2007-03-27 |
| 7032536 | Thin film formation apparatus including engagement members for support during thermal expansion | Yusuke Fukuoka, Yasushi Fujioka, Katsushi Kishimoto, Hiroyuki Fukuda | 2006-04-25 |
| RE39064 | Electronic device manufacturing apparatus and method for manufacturing electronic device | Osamu Sakai | 2006-04-18 |
| 6979589 | Silicon-based thin-film photoelectric conversion device and method of manufacturing thereof | Katsushi Kishimoto, Yusuke Fukuoka | 2005-12-27 |
| 6242686 | Photovoltaic device and process for producing the same | Katsushi Kishimoto, Takanori Nakano, Hitoshi Sannomiya | 2001-06-05 |
| 6142096 | Electronic device manufacturing apparatus and method for manufacturing electronic device | Osamu Sakai | 2000-11-07 |
| 6009828 | Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method | Takashi Tomita, Yoshihiro Yamamoto, Hitoshi Sannomiya, Sae Takagi | 2000-01-04 |
| 5618758 | Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method | Takashi Tomita, Yoshihiro Yamamoto, Hitoshi Sannomiya, Sae Takagi | 1997-04-08 |
| 5487786 | Plasma chemical vapor deposition device capable of suppressing generation of polysilane powder | Atsushi Chida, Hitoshio Sannomiya, Hiroshi Okamoto, Yoshihiro Yamamoto | 1996-01-30 |