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Chemical supply apparatus, method for removing particles from chemical, nozzle unit, and substrate treating apparatus |
Yong Hoon HONG, Dohyeon YOON, Ji-Young Lee, Young-Su Kim |
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| 11424139 |
Apparatus and method for treating substrate, and nozzle unit |
Yong Hoon HONG, Ji-Young Lee |
2022-08-23 |
| 11280753 |
Sensors for detecting substitution between chemicals and methods of manufacturing a semiconductor device using the sensor |
Daesung Jung, Jiyoung Lee, Jongmin Song, Sangyoon Soh |
2022-03-22 |
| 10825699 |
Standby port and substrate processing apparatus having the same |
Buyoung Jung, Jonghan Kim, Young Jin Jang, Jin Tack Yu, Youngjun Choi +5 more |
2020-11-03 |
| 10707101 |
Substrate treating apparatus and substrate treating method |
Sul Lee |
2020-07-07 |
| 10304687 |
Substrate treating apparatus and substrate treating method |
Soyoung Park |
2019-05-28 |
| 10109506 |
Unit for supplying fluid, apparatus and method for treating substrate with the unit |
Young-Hun Lee |
2018-10-23 |
| 9802150 |
Carbon dioxide absorbent based on amine having nitrile functional group, and carbon dioxide absorption method and separation method using same |
Hoon Kim, Young Seop CHOI, Youngeun Cheon |
2017-10-31 |
| 8927763 |
Method for preparing aliphatic diisocyanate |
Hoon Kim, Ji-Young OH, Seunghoon Shin, Seok Soo Kim, Kyung Sik Lim +1 more |
2015-01-06 |
