Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7517617 | Mask blank for use in EUV lithography and method for its production | Lutz Aschke, Mario Schiffler, Frank Sobel, Hans Becker | 2009-04-14 |
| 7029803 | Attenuating phase shift mask blank and photomask | Hans Becker, Ute Buttgereit, Gunter Hess, Oliver Goetzberger, Frank Schmidt +2 more | 2006-04-18 |