Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7268853 | Exposing systems providing post exposure baking and related methods | Sung-Jae Ryu, Sang-Kap Kim, Yoon-Ho Eo | 2007-09-11 |
| 7208878 | Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode | Jai-kwang Shin, Seong-gu Kim, Hyeon-ill Um | 2007-04-24 |
| 7119489 | Rotation-magnetron-in-magnetron (RMIM) electrode, method of manufacturing the RMIM electrode, and sputtering apparatus including the RMIM electrode | Jai-kwang Shin, Seong-gu Kim, Hyeon-ill Um | 2006-10-10 |
| 7109132 | High density plasma chemical vapor deposition process | Jai-Hyung Won | 2006-09-19 |
| 6953739 | Method for manufacturing a semiconductor device having hemispherical grains at very low atmospheric pressure using first, second, and third vacuum pumps | Chang-jip Yang, Chan Hee HAN, Jae Wook Kim | 2005-10-11 |
| 6723215 | Sputtering apparatus for forming a metal film using a magnetic field | Hyeon-ill Um, Jai-kwang Shin, Seong-gu Kim | 2004-04-20 |
| 6683010 | Method for forming silicon-oxynitride layer on semiconductor device | Baek-gyun Lim, Eu-seok Kim, Chang-jip Yang | 2004-01-27 |
| 6673673 | Method for manufacturing a semiconductor device having hemispherical grains | Chang-jip Yang, Chan Hee HAN, Jae Wook Kim | 2004-01-06 |
| 6312987 | Method for manufacturing semiconductor device having hemispherical grain polysilicon film | Chan Hee HAN, Young Ho Kang, Chang-jip Yang | 2001-11-06 |
| 6090188 | Air intake apparatus of chemical vapor deposition equipment and method for removing ozone using the same | Chang-jip Yang, Geun-mok Youk, Chong-hyeong Cho | 2000-07-18 |
| 6074486 | Apparatus and method for manufacturing a semiconductor device having hemispherical grains | Chang-jip Yang, Chan Hee HAN, Jae Wook Kim | 2000-06-13 |
| 5842690 | Semiconductor wafer anchoring device | Che Lee, Seok-Jun Lee | 1998-12-01 |
| 5821152 | Methods of forming hemispherical grained silicon electrodes including multiple temperature steps | Chan Hee HAN, Chang-jip Yang, Jae Wook Kim | 1998-10-13 |