Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10622443 | Semiconductor device with different material layers in element separation portion trench and method for manufacturing semiconductor device | Bungo TANAKA, Michihiko Mifuji | 2020-04-14 |
| 10566941 | Integrated circuit and method of manufacturing integrated circuit | Naohiro Nomura, Sachito Horiuchi | 2020-02-18 |
| 10554179 | Differential circuit | Naohiro Nomura, Sachito Horiuchi, Takatoshi Manabe | 2020-02-04 |
| 9425203 | Non-volatile memory cell in semiconductor device | Bungo TANAKA, Michihiko Mifuji | 2016-08-23 |
| 9082654 | Method of manufacturing non-volatile memory cell with simplified step of forming floating gate | Bungo TANAKA, Michihiko Mifuji | 2015-07-14 |
| 8367560 | Semiconductor device manufacturing method | Arito OGAWA, Hiroyuki Ota | 2013-02-05 |
| 8207584 | Semiconductor device and manufacturing method of the same | Toshihide Nabatame, Yuuichi Kamimuta | 2012-06-26 |
| 7884423 | Semiconductor device and fabrication method thereof | Arito OGAWA, Yuuichi Kamimuta | 2011-02-08 |
| 7790627 | Semiconductor device, method of manufacturing the same, and method of manufacturing metal compound thin film | Toshihide Nabatame, Koji Tominaga, Tetsuji Yasuda | 2010-09-07 |
| 7772678 | Metallic compound thin film that contains high-k dielectric metal, nitrogen, and oxygen | Koji Tominaga, Toshihide Nabatame, Tomoaki Nishimura | 2010-08-10 |
| 7482234 | Method of fabricating a metal oxynitride thin film that includes a first annealing of a metal oxide film in a nitrogen-containing atmosphere to form a metal oxynitride film and a second annealing of the metal oxynitride film in an oxidizing atmosphere | Koji Tominaga, Toshihide Nabatame, Tomoaki Nishimura | 2009-01-27 |
| 7419920 | Metal thin film and semiconductor comprising a metal thin film | Koji Tominaga, Toshihide Nabatame | 2008-09-02 |
| 7397094 | Semiconductor device and manufacturing method thereof | Toshihide Nabatame, Akira Toriumi, Tsuyoshi Horikawa, Koji Tominaga | 2008-07-08 |
| 7387686 | Film formation apparatus | Toshihide Nabatame, Koji Tominaga, Tetsuji Yasuda | 2008-06-17 |
| 7372112 | Semiconductor device, process for producing the same and process for producing metal compound thin film | Toshihide Nabatame, Koji Tominaga, Tetsuji Yasuda | 2008-05-13 |