Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10508357 | Method of filling through-holes to reduce voids and other defects | Nagarajan Jayaraju, Leon Barstad, Joanna Dziewiszek | 2019-12-17 |
| 10508349 | Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of pyrazole compounds and bisepoxides | Ravi Pokhrel, Matthew Thorseth, James Byrnes, Mark Scalisi, Joanna Dziewiszek | 2019-12-17 |
| 10196751 | Nitrogen containing polymers as levelers | Lingli Duan, Chen Chen, Tong Sun, Maria Anna Rzeznik | 2019-02-05 |
| 10201097 | Polymers containing benzimidazole moieties as levelers | Lingli Duan, Yang Li, Tong Sun, Shaoguang Feng, Chen Chen +1 more | 2019-02-05 |
| 10190226 | Reaction products of heterocyclic nitrogen compounds polyepoxides and polyhalogens | Julia Kozhukh | 2019-01-29 |
| 10190228 | Copper electroplating baths and electroplating methods capable of electroplating megasized photoresist defined features | Matthew Thorseth, Rebecca Hazebrouck, Mark Scalisi, Joanna Dziewiszek | 2019-01-29 |
| 10100421 | Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of imidazole and bisepoxide compounds | Matthew Thorseth, Yi Qin, Julia Woertink, Joanna Dziewiszek, Erik Reddington +1 more | 2018-10-16 |
| 10104782 | Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of pyridyl alkylamines and bisepoxides | Matthew Thorseth, Yi Qin, Julia Woertink, Joanna Dziewiszek, Erik Reddington +1 more | 2018-10-16 |
| 10041182 | Reaction products of amino acids and epoxies | Maria Anna Rzeznik | 2018-08-07 |
| 10006136 | Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of imidazole compounds, bisepoxides and halobenzyl compounds | Matthew Thorseth, Yi Qin, Julia Woertink, Julia Kozhukh, Erik Reddington +1 more | 2018-06-26 |
| 9932684 | Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of alpha amino acids and bisepoxides | Matthew Thorseth, Yi Qin, Julia Woertink, Joanna Dziewiszek, Erik Reddington +1 more | 2018-04-03 |
| 9783903 | Additives for electroplating baths | Julia Kozhukh, Maria Anna Rzeznik | 2017-10-10 |
| 9783905 | Reaction products of amino acids and epoxies | Maria Anna Rzeznik | 2017-10-10 |
| 9725816 | Amino sulfonic acid based polymers for copper electroplating | Weijing Lu, Maria Anna Rzeznik | 2017-08-08 |
| 9611560 | Sulfonamide based polymers for copper electroplating | Weijing Lu, Maria Anna Rzeznik | 2017-04-04 |
| 9598786 | Amino sulfonic acid based polymers for copper electroplating | Weijing Lu, Maria Anna Rzeznik | 2017-03-21 |
| 9562300 | Sulfonamide based polymers for copper electroplating | Weijing Lu, Maria Anna Rzeznik | 2017-02-07 |
| 9518324 | Copolymers of diglycidyl ether terminated polysiloxane compounds and non-aromatic polyamines | Julia Kozhukh, Kristen M. Milum | 2016-12-13 |
| 9499912 | Copolymers of diglycidyl ether terminated polysiloxane compounds and non-aromatic polyamines | Julia Kozhukh, Kristen M. Milum | 2016-11-22 |
| 9439294 | Reaction products of heterocyclic nitrogen compounds polyepoxides and polyhalogens | Julia Kozhukh | 2016-09-06 |
| 9435045 | Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens | Julia Kozhukh, Maria Anna Rzeznik | 2016-09-06 |
| 9404193 | Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens | Julia Kozhukh, Maria Anna Rzeznik | 2016-08-02 |
| 9403762 | Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens | Julia Kozhukh, Maria Anna Rzeznik | 2016-08-02 |
| 8454815 | Plating bath and method | Maria Anna Rzeznik | 2013-06-04 |