JD

Joanna Dziewiszek

RM Rohm And Haas Electronic Materials: 6 patents #105 of 562Top 20%
Dow Global Technologies: 3 patents #1,458 of 4,534Top 35%
📍 Boxborough, MA: #92 of 320 inventorsTop 30%
🗺 Massachusetts: #20,307 of 88,656 inventorsTop 25%
Overall (All Time): #833,638 of 4,157,543Top 25%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
10508349 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of pyrazole compounds and bisepoxides Ravi Pokhrel, Matthew Thorseth, James Byrnes, Mark Scalisi, Zuhra I. Niazimbetova 2019-12-17
10508357 Method of filling through-holes to reduce voids and other defects Nagarajan Jayaraju, Leon Barstad, Zuhra I. Niazimbetova 2019-12-17
10190228 Copper electroplating baths and electroplating methods capable of electroplating megasized photoresist defined features Matthew Thorseth, Rebecca Hazebrouck, Mark Scalisi, Zuhra I. Niazimbetova 2019-01-29
10100421 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of imidazole and bisepoxide compounds Matthew Thorseth, Zuhra I. Niazimbetova, Yi Qin, Julia Woertink, Erik Reddington +1 more 2018-10-16
10104782 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of pyridyl alkylamines and bisepoxides Matthew Thorseth, Zuhra I. Niazimbetova, Yi Qin, Julia Woertink, Erik Reddington +1 more 2018-10-16
9932684 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of alpha amino acids and bisepoxides Matthew Thorseth, Zuhra I. Niazimbetova, Yi Qin, Julia Woertink, Erik Reddington +1 more 2018-04-03